SCHEMBL5504958

SCHEMBL5504958

CC(O)(C=O)Cc1ccc(O)cc1

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.57
ESR2 Q92731 8/20 0.57
BLM P54132 1/20 0.50
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
ESRRG P62508 2/20 0.41
TSHR P16473 2/20 0.41
LMNA P02545 1/20 0.41
TYR P14679 1/20 0.41
CYP3A4 P08684 1/20 0.41
AR P10275 1/20 0.41
HPGD P15428 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
HTR6 P50406 1/20 0.41
SLC6A3 Q01959 1/20 0.41
HSD17B10 Q99714 1/20 0.41
SHBG P04278 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6460135 0.86 HPGD (0.41) ESR1ESR2MEN1KMT2ATSHR
SCHEMBL3634160 0.84 TSHR (0.50) ESR1ESR2ESRRGTSHRLMNA
SCHEMBL29204293 0.82 SLC6A4 (0.52) MEN1KMT2ALMNACYP3A4SLC6A2
SCHEMBL28806779 0.82 SLC6A2 (0.48) MEN1KMT2ATSHRLMNACYP3A4
SCHEMBL2314314 0.82 SLC6A2 (0.48) MEN1KMT2ATSHRLMNACYP3A4
SCHEMBL6455526 0.81 PPARA (0.44) ESR1ESR2TSHR
SCHEMBL23413775 0.79 CYP2D6 (0.44) MEN1KMT2ATSHRLMNATYR
SCHEMBL10456066 0.79 TAAR1 (0.48) BLMKMT2AESRRGTSHRSLC6A2
SCHEMBL9332631 0.79 THRA (0.41) ESR1ESR2BLMMEN1KMT2A
SCHEMBL8796874 0.79 EPHX2 (0.44) ESR1ESR2MEN1KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1805137-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-07-11 EP disclosed
WO-2006046736-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO K.K. (JP) 2006-05-04 WO disclosed
EP-0752408-B1 Radiation curable acrylates incorporating photoinitiators BASF AG (DE) 2001-01-10 EP disclosed
EP-0752408-A2 Radiation curable acrylates incorporating photoinitiators BASF AKTIENGESELLSCHAFT (DE) 1997-01-08 EP disclosed
US-5314936-A Aqueous polymer dispersions containing organic compounds having carbonate groups and carbonyl groups and paints and coating systems produced therewith BASF AKTIENGESELLSCHAFT (DE) 1994-05-24 US disclosed
EP-0377191-B1 Radiation-sensitive ethylenically unsaturated copolymerisable compounds, and process for their preparation BASF AG (DE) 1994-03-23 EP disclosed
US-5292915-A Emulsifier BASF AKTIENGESELLSCHAFT (DE) 1994-03-08 US disclosed
EP-0499836-A2 Carbonate and carbonyl-containing compounds, their preparation and applications BASF Aktiengesellschaft (DE) 1992-08-26 EP disclosed
EP-0217205-B1 COPOLYMERISABLE PHOTOINITIATORS CIBA-GEIGY AG (CH) 1991-12-11 EP disclosed
EP-0377198-A2 Chloroformiates of aromatic ketones, and process for their preparation BASF Aktiengesellschaft (DE) 1990-07-11 EP disclosed
EP-0217205-A2 Copolymerisable photoinitiators CIBA-GEIGY AG (CH) 1987-04-08 EP disclosed