SCHEMBL5520086

SCHEMBL5520086

C=C(CC(F)(F)C(F)(F)F)C(=O)O.C=C(CCC(F)(F)F)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.47
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL562800 0.86 TET2 (0.59) TET2TET3TET1
SCHEMBL221789 0.86 TET2 (0.43) TET2TET3TET1
SCHEMBL261639 0.82 TET2 (0.45) TET2TET3TET1
Methacrylic Acid SCHEMBL28829566 0.79 TET2 (0.52) TET2TET3TET1
SCHEMBL532501 0.78 TET2 (0.55) TET2TET3TET1
SCHEMBL8171511 0.77 TET2 (0.37) TET2
SCHEMBL532860 0.76 TET2 (0.44) TET2TET3TET1
SCHEMBL2976462 0.75 TET2 (0.42) TET2TET3TET1
SCHEMBL701230 0.74 TET2 (0.50) TET2TET3TET1
SCHEMBL562995 0.74 TET2 (0.55) TET2TET3TET1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070269734-A1 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern JSR CORPORATION (JP) 2007-11-22 US disclosed