⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1629029 | 0.87 | — | — | |
| Zinc Ion SCHEMBL30416679 | 0.87 | — | — | |
| Zinc Ion SCHEMBL65482 | 0.87 | — | — | |
| Zinc Ion SCHEMBL11589310 | 0.87 | — | — | |
| Zinc Ion SCHEMBL5908729 | 0.87 | — | — | |
| Water SCHEMBL31072894 | 0.75 | — | — | |
| Zinc Ion SCHEMBL1681738 | 0.75 | — | — | |
| Zinc Ion SCHEMBL2321523 | 0.75 | — | — | |
| SCHEMBL7267994 | 0.75 | — | — | |
| Zinc Ion SCHEMBL526853 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1670610-B1 | LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION | OPTOMEC DESIGN (US) | 2018-05-30 | — | — | EP | disclosed |
| US-8110247-B2 | Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials | OPTOMEC DESIGN COMPANY (US) | 2012-02-07 | — | — | US | disclosed |
| EP-1670610-A4 | LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION | OPTOMEC DESIGN (US) | 2008-09-10 | — | — | EP | disclosed |
| US-7294366-B2 | Laser processing for heat-sensitive mesoscale deposition | OPTOMEC DESIGN COMPANY (US) | 2007-11-13 | — | — | US | disclosed |
| US-20070019028-A1 | Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials | OPTOMEC DESIGN COMPANY (US) | 2007-01-25 | — | — | US | disclosed |
| EP-1670610-A2 | LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION | Optomec Design Company (US) | 2006-06-21 | — | — | EP | disclosed |
| US-20050129383-A1 | Laser processing for heat-sensitive mesoscale deposition | OPTOMEC DESIGN COMPANY (US) | 2005-06-16 | — | — | US | disclosed |
| WO-2005039814-A2 | LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION | OPTOMEC DESIGN COMPANY (US) | 2005-05-06 | — | — | WO | disclosed |