SCHEMBL5532030

SCHEMBL5532030

CCC(Br)CCCC(Br)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19439531 0.90 LCK (0.37)
SCHEMBL3649908 0.88 LMNA (0.46)
SCHEMBL12462663 0.88 TSHR (0.32)
SCHEMBL1003367 0.87
SCHEMBL18107467 0.86
SCHEMBL16136779 0.86
SCHEMBL3803518 0.85
SCHEMBL598141 0.84
SCHEMBL19637995 0.84
SCHEMBL647281 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9783670-B2 Epoxy resin composition, prepreg, and fiber-reinforced composite material TORAY INDUSTRIES, INC. (JP) 2017-10-10 US disclosed
EP-2975088-A1 EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL Toray Industries, Inc. (JP) 2016-01-20 EP disclosed
US-20160002460-A1 EPOXY RESIN COMPOSITION, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL TORAY INDUSTRIES, INC. (JP) 2016-01-07 US disclosed
CN-103492957-B Conductive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2015-09-09 CN disclosed
EP-2696245-B1 CONDUCTIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC DEVICE CANON KK (JP) 2015-08-19 EP disclosed
EP-2696245-A1 ELECTROCONDUCTIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC DEVICE Canon Kabushiki Kaisha (JP) 2014-02-12 EP disclosed
US-20120308261-A1 CONDUCTIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2012-12-06 US disclosed
US-20070166250-A1 COSMETIC POLYMER COMPOSITION AND COSMETIC MITSUBISHI CHEMICAL CORPORATION 2007-07-19 US disclosed
US-7049454-B2 Alkoxysilacycloalkanes, process for their preparation and their use for the polymerization of olefins ARKEMA (FR) 2006-05-23 US disclosed
US-20040223933-A1 Cosmetic polymer composition and cosmetic MITSUBISHI CHEMICAL CORPORATION 2004-11-11 US disclosed
CN-1170855-C Process for preparation of olefines in existing of dialkoxy silicon cyclohexylane ���з��ɹ�˾ 2004-10-13 CN disclosed
EP-1440680-A1 COSMETIC POLYMER COMPOSITION AND COSMETIC Mitsubishi Chemical Corporation (JP) 2004-07-28 EP disclosed
US-20040014913-A1 Alkoxysilacycloalkanes, process for their preparation and their use for the polymerization of olefins TOTAL PETROCHEMICALS FRANCE (FR) 2004-01-22 US disclosed
US-6624264-B2 Preparation from a tetralkyl silicate and an alkylenebis(magnesium bromide) ATOFINA (FR) 2003-09-23 US disclosed
EP-1054015-B1 Olefin polymerisation in presence of dialkoxysilacyclohexanes ATOFINA (FR) 2003-08-13 EP disclosed
US-20030036616-A1 Alkoxysilacycloalkanes, process for their preparation and their use for the polymerization of olefins TOTAL PETROCHEMICALS FRANCE (FR) 2003-02-20 US disclosed
CN-1285360-A Process for preparation of olefines in existing of dialkoxy silicon cyclohexylane ATOPHNA SA (FR) 2001-02-28 CN disclosed
EP-1054015-A1 Olefin polymerisation in presence of dialkoxysilacyclohexanes Atofina (FR) 2000-11-22 EP disclosed