⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8935180 | 0.75 | — | — | |
| SCHEMBL11146087 | 0.72 | — | — | |
| SCHEMBL7253367 | 0.70 | — | — | |
| Sulfuric Acid SCHEMBL8518134 | 0.67 | CA5A (0.38) | — | |
| SCHEMBL601920 | 0.65 | — | — | |
| SCHEMBL28237832 | 0.65 | — | — | |
| SCHEMBL1162667 | 0.65 | — | — | |
| SCHEMBL6429875 | 0.64 | — | — | |
| SCHEMBL1047029 | 0.62 | — | — | |
| SCHEMBL4243337 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 309 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9165777-B2 | Polishing agent and method for polishing substrate using the polishing agent | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-20 | — | — | US | claimed |
| US-9129900-B2 | — | — | 2015-09-08 | — | — | US | claimed |
| US-8617275-B2 | Polishing agent and method for polishing substrate using the polishing agent | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-12-31 | — | — | US | claimed |
| US-8597550-B2 | Method for producing water-resistant polarizing film | NITTO DENKO CORPORATION (JP) | 2013-12-03 | — | — | US | claimed |
| US-20110097483-A1 | METHOD FOR PRODUCING WATER-RESISTANT POLARIZING FILM | NITTO DENKO CORPORATION (JP) | 2011-04-28 | — | — | US | claimed |
| US-12029800-B2 | Composite particles including anionic polymer and cationic polymer or peptide, and method for producing composite particles | POLA CHEMICAL INDUSTRIES, INC. (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118076892-A | Blood cell separating agent for analysis and blood cell separating method | 日东纺绩株式会社 | 2024-05-24 | — | — | CN | disclosed |
| US-20240150604-A1 | PRETREATMENT COMPOSITION, PRINT SET, AND TEXTILE PRINTING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-09 | — | — | US | disclosed |
| US-20240150605-A1 | PRETREATMENT LIQUID FOR INKJET TEXTILE PRINTING, INK SET, AND TEXTILE PRINTING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2024-05-09 | — | — | US | disclosed |
| CN-115538197-B | Method for producing printed matter | 理想科学工业株式会社 | 2024-04-05 | — | — | CN | disclosed |
| EP-3757179-B1 | INK COMPOSITION FOR INK JET PRINTING, IMAGE FORMING METHOD, AND RECORDED MATERIAL | FUJIFILM CORP (JP) | 2024-03-13 | — | — | EP | disclosed |
| CN-115192468-B | Composite particles comprising anionic polymer and cationic polymer or peptide, and method for producing same | 宝丽化学工业有限公司 | 2024-02-13 | — | — | CN | disclosed |
| US-20100255365-A1 | PACKING MATERIAL FOR LITHIUM CELL AND PRODUCTION METHOD THEREOF | TOPPAN PRINTING CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-2202823-A1 | PACKING MATERIAL FOR LITHIUM BATTERY AND METHOD FOR MANUFACTURING THE SAME | Toppan Printing Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-20100068248-A1 | Patch and patch preparation | NITTO DENKO CORPORATION | 2010-03-18 | — | — | US | disclosed |
| EP-2163267-A2 | Patch and patch preparation | Nitto Denko Corporation (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100015451-A1 | PACKING MATERIAL FOR LITHIUM CELL AND PRODUCTION METHOD THEREOF | TOPPAN PRINTING CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2112703-A1 | PACKAGING MATERIAL FOR LITHIUM BATTERY AND METHOD FOR PRODUCING THE SAME | Toppan Printing Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| US-20090258203-A1 | Inkjet recording method and recording product | SEIKO EPSON CORPORATION (JP) | 2009-10-15 | — | — | US | disclosed |
| US-20090095637-A1 | Electrochemical polishing method and polishing method | EBARA CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |