SCHEMBL5538388

SCHEMBL5538388

CCCCCCCCCCCCCCCCC(C(=O)O)[N+](C)(C)C

nearest known ligand 0.55

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.55
FFAR1 O14842 2/20 0.55
MAPT P10636 1/20 0.53
LCK P06239 1/20 0.53
PPARD Q03181 1/20 0.53
ZDHHC20 Q5W0Z9 1/20 0.53
ZDHHC2 Q9UIJ5 1/20 0.53
ACE2 Q9BYF1 1/20 0.50
GRIK1 P39086 2/20 0.46
GRIK2 Q13002 2/20 0.46
FFAR4 Q5NUL3 1/20 0.46
SLC1A2 P43004 1/20 0.43
SLC1A1 P43005 1/20 0.43
CA2 P00918 1/20 0.42
HSPD1 P10809 1/20 0.42
BLM P54132 1/20 0.42
HSPE1 P61604 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5538136 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5533881 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5535755 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5538791 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5533534 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5538770 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5533504 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5532636 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5532389 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD
SCHEMBL5535233 1.00 GPR84 (0.55) GPR84FFAR1MAPTLCKPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4482988-B1 PROCESS FOR LIMING OF HIDES, SKINS OR PELTS STAHL INT B V (NL) 2025-11-05 EP disclosed
US-20250188551-A1 PROCESS FOR LIMING OF HIDES, SKINS OR PELTS STAHL INTERNATIONAL B.V. (NL) 2025-06-12 US disclosed
EP-4482988-A1 PROCESS FOR LIMING OF HIDES, SKINS OR PELTS Stahl International B.V. (NL) 2025-01-01 EP disclosed
WO-2023163594-A1 PROCESS FOR LIMING OF HIDES, SKINS OR PELTS STAHL INTERNATIONAL B.V. (NL) 2023-08-31 WO disclosed
US-20170190928-A1 COLORING COMPOSITION, INK JET RECORDING INK, AND INK JET RECORDING METHOD FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed
US-20100247771-A1 INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20100080908-A1 INK SET AND METHOD FOR FORMING IMAGE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-7527683-B2 Ink for ink-jet recording, ink set, and ink-jet recording method FUJIFILM CORPORATION (JP) 2009-05-05 US disclosed
US-7438752-B2 Ink composition and recording method FUJIFILM CORPORATION (JP) 2008-10-21 US disclosed
US-7404851-B2 Ink composition and recording method using the same FUJIFILM CORPORATION (JP) 2008-07-29 US disclosed
US-7291212-B2 Ink and ink set for ink jet printing and method of ink jet printing FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
CN-100335604-C Composition of a nonionic silicone surfactant and nonionic surfactant in solid block detergent ECOLAB INC (US) 2007-09-05 CN disclosed
US-20070176992-A1 Ink composition and recording method FUJIFILM CORPORATION (JP) 2007-08-02 US disclosed
US-20070176991-A1 Ink composition and recording method using the same FUJIFILM CORPORATION (JP) 2007-08-02 US disclosed
US-20070044831-A1 Electrolyte composition and dye-sensitized solar cell NATIONAL UNIVERSITY CORPORATION KYUSHU INSTITUTE OF TECHNOLOGY (JP) 2007-03-01 US disclosed
CN-1243537-A Mixtures of nonionic silicone surfactants and nonionic surfactants in solid block detergents ECOLAB INC (US) 2000-02-02 CN disclosed