Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.41 |
| ▸ | PPARG | P37231 | 1/20 | 0.33 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15657730 | 0.89 | CYP1A2 (0.50) | CYP1A2PPARGEPHX1 | |
| SCHEMBL15656524 | 0.87 | CYP1A2 (0.57) | CYP1A2PPARGSIRT2EPHX1 | |
| SCHEMBL15654842 | 0.85 | CYP1A2 (0.60) | CYP1A2PPARGEPHX1 | |
| SCHEMBL236683 | 0.83 | — | — | |
| SCHEMBL18721202 | 0.82 | CYP1A2 (0.31) | CYP1A2 | |
| SCHEMBL164146 | 0.79 | — | — | |
| SCHEMBL30458519 | 0.78 | CYP1A2 (0.55) | CYP1A2PPARGEPHX1 | |
| SCHEMBL19283428 | 0.78 | CYP1A2 (0.55) | CYP1A2PPARGEPHX1 | |
| SCHEMBL28944959 | 0.77 | — | — | |
| SCHEMBL28342319 | 0.76 | FAAH (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115528303-A | Lithium ion battery and application thereof | 珠海冠宇电池股份有限公司 | 2022-12-27 | — | — | CN | claimed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11650497-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11644751-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11586111-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20220411727-A1 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-9606433-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9557647-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20160222168-A1 | Composition and Polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-08-04 | — | — | US | disclosed |
| US-9334371-B2 | Composition and polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| EP-2735581-A1 | COMPOSITION AND POLYMER | Asahi Kasei Chemicals Corporation (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140121293-A1 | Composition and Polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2014-05-01 | — | — | US | disclosed |
| US-20130108965-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (TW) | 2013-05-02 | — | — | US | disclosed |
| US-20070178379-A1 | Non-aqueous electrolyte secondary battery and non-aqueous electrolyte | SANYO ELECTRIC CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1806806-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY AND NON-AQUEOUS ELECTROLYTE | Sanyo Electric Co., Ltd. (JP) | 2007-07-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | SLC11A2, DRD1, ZYX | CYP1A2 699/4885PPARG 2282/4885SIRT2 4605/4885 |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | CYP1A2 2004/4885PPARG 3706/4885SIRT2 1890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.