Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.75 |
| ▸ | TSHR | P16473 | 6/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | HTR2C | P28335 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | HRH1 | P35367 | 1/20 | 0.33 |
| ▸ | DRD3 | P35462 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.32 |
| ▸ | METAP1 | P53582 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.32 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | FDPS | P14324 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20298310 | 0.91 | LMNA (0.71) | LMNATSHRCHRM1AKR1A1CHRM3 | |
| Ethohexadiol SCHEMBL27621584 | 0.89 | LMNA (0.95) | LMNATSHRTDP1SPHK1CYP3A4 | |
| Ethohexadiol SCHEMBL6282991 | 0.86 | LMNA (1.00) | LMNATSHRTDP1SPHK1CYP3A4 | |
| Ethohexadiol SCHEMBL38007 | 0.86 | LMNA (1.00) | LMNATSHRTDP1SPHK1CYP3A4 | |
| SCHEMBL5674208 | 0.84 | LMNA (0.56) | LMNATSHRFDPS | |
| SCHEMBL11601577 | 0.84 | LMNA (0.62) | LMNATSHR | |
| Ethohexadiol SCHEMBL11502837 | 0.84 | LMNA (0.95) | LMNATSHRTDP1SPHK1CYP3A4 | |
| Ethohexadiol SCHEMBL10731659 | 0.84 | LMNA (0.95) | LMNATSHRTDP1SPHK1CYP3A4 | |
| Ethohexadiol SCHEMBL610774 | 0.84 | LMNA (0.95) | LMNATSHRTDP1SPHK1CYP3A4 | |
| Ethohexadiol SCHEMBL20787860 | 0.84 | LMNA (0.95) | LMNATSHRTDP1SPHK1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3558903-B1 | PROCESS FOR PHOSPHORYLATING A COMPLEX ALCOHOL | AVECHO BIOTECHNOLOGY LTD (AU) | 2024-07-03 | — | — | EP | disclosed |
| US-11753435-B2 | Process | AVECHO BIOTECHNOLOGY LIMITED (AU) | 2023-09-12 | — | — | US | disclosed |
| US-20220106353-A1 | PROCESS | AVECHO BIOTECHNOLOGY LIMITED (AU) | 2022-04-07 | — | — | US | disclosed |
| CN-110662733-A | Method of producing a composite material | 埃维科生物技术有限公司 | 2020-01-07 | — | — | CN | disclosed |
| US-20190330260-A1 | PROCESS | AVECHO BIOTECHNOLOGY LIMITED (AU) | 2019-10-31 | — | — | US | disclosed |
| EP-3558903-A1 | PROCESS | Avecho Biotechnology Limited (AU) | 2019-10-30 | — | — | EP | disclosed |
| WO-2018112512-A1 | PROCESS | PHOSPHAGENICS LIMITED (AU) | 2018-06-28 | — | — | WO | disclosed |
| US-9504753-B2 | Nanometer-sized prodrugs of NSAIDs | CEDARS-SINAI MEDICAL CENTER (US) | 2016-11-29 | — | — | US | disclosed |
| US-8178639-B2 | Polymer for forming organic anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-05-15 | — | — | US | disclosed |
| US-8026042-B2 | Polymer for organic anti-reflective coating layer and composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-20110003478-A1 | POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME | KIM SANG-JEOUNG | 2011-01-06 | — | — | US | disclosed |
| US-20100266967-A1 | POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER | DONGJIN SEMICHEM CO., LTD (KR) | 2010-10-21 | — | — | US | disclosed |
| US-7629110-B2 | polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-12-08 | — | — | US | disclosed |
| US-7465531-B2 | Copolyalkylene oxide of optionally substituted alkyl 1,2-epoxypropionate and 9-anthracenylmethyl 2,3-epoxypropionate; between etching layer and photoresist to absorb exposure light in photolithography; prevents the occurrence of standing wave, undercutting and notching to obtain uniform pattern profile | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-12-16 | — | — | US | disclosed |
| US-20080131815-A1 | polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-06-05 | — | — | US | disclosed |
| US-7368219-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-05-06 | — | — | US | disclosed |
| US-7309561-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-12-18 | — | — | US | disclosed |
| US-7282530-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-10-16 | — | — | US | disclosed |