Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.38 |
| ▸ | PRKCA | P17252 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL28068720 | 0.94 | TSHR (0.41) | TSHRALDH1A1SMN1; SMN2MAPK1GAA | |
| SCHEMBL5604621 | 0.86 | TSHR (0.45) | TSHRALDH1A1SMN1; SMN2MAPK1GAA | |
| SCHEMBL9936885 | 0.85 | TSHR (0.32) | TSHRPRKCAHTT | |
| SCHEMBL22592233 | 0.84 | PRKCA (0.38) | TSHRPRKCAHTT | |
| SCHEMBL13737582 | 0.84 | MAPT (0.41) | TSHRMAPK1PRKCAHTTMAPT | |
| SCHEMBL22883305 | 0.84 | TSHR (0.43) | TSHRALDH1A1SMN1; SMN2MAPK1GAA | |
| SCHEMBL23918820 | 0.82 | TSHR (0.42) | TSHRALDH1A1SMN1; SMN2MAPK1GAA | |
| SCHEMBL4170335 | 0.82 | PRKCA (0.33) | PRKCAHTT | |
| SCHEMBL27777270 | 0.82 | TSHR (0.42) | TSHRALDH1A1SMN1; SMN2MAPK1GAA | |
| SCHEMBL7763970 | 0.82 | TSHR (0.42) | TSHRALDH1A1SMN1; SMN2MAPK1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119386497-A | Shunt-in-situ matrix purification liquid-liquid electric extraction device, method and application | 南方医科大学 | 2025-02-07 | — | — | CN | claimed |
| CN-118001879-A | Application of nano copper alloy in filtering harmful substances in cigarette smoke | 广东合一新材料研究院有限公司 | 2024-05-10 | — | — | CN | claimed |
| CN-107353189-A | Prepare 3,5 dichloro a（Trifluoromethyl）The method of styrene | 荆门医药工业技术研究院 | 2017-11-17 | — | — | CN | claimed |
| US-9427777-B2 | Process for producing charge retention medium | ASAHI GLASS COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | claimed |
| CN-119386497-A | Shunt-in-situ matrix purification liquid-liquid electric extraction device, method and application | 南方医科大学 | 2025-02-07 | — | — | CN | disclosed |
| CN-118001879-A | Application of nano copper alloy in filtering harmful substances in cigarette smoke | 广东合一新材料研究院有限公司 | 2024-05-10 | — | — | CN | disclosed |
| US-20230350294-A1 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20230299354-A1 | ELECTROLYTE, AND ELECTROCHEMICAL APPARATUS AND ELECTRONIC APPARATUS CONTAINING SAME | NINGDE AMPEREX TECHNOLOGY LIMITED (CN) | 2023-09-21 | — | — | US | disclosed |
| US-20230299354-A1 | ELECTROLYTE, AND ELECTROCHEMICAL APPARATUS AND ELECTRONIC APPARATUS CONTAINING SAME | NINGDE AMPEREX TECHNOLOGY LIMITED (CN) | 2023-09-21 | — | — | US | disclosed |
| US-20200326624-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-15 | — | — | US | disclosed |
| US-8486534-B2 | Surface-modified polymer films | BAR-ILAN UNIVERSITY (IL) | 2013-07-16 | — | — | US | disclosed |
| US-20130053493-A1 | METHOD FOR PRODUCING FLUORINATED COPOLYMER COMPOSITION, COATING COMPOSITION, ARTICLE HAVING COATING FILM, AND MOLDED PRODUCT | ASAHI GLASS COMPANY, LIMITED (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-2559742-A1 | COATING COMPOSITION AND PRODUCTION METHOD FOR SAME, AND FORMATION METHOD FOR COATING FILM USING SAME | Asahi Glass Company, Limited (JP) | 2013-02-20 | — | — | EP | disclosed |
| CN-102892814-A | Production method for fluorine-containing copolymer composition, coating composition, molded article and article having coating film | ASAHI GLASS CO LTD | 2013-01-23 | — | — | CN | disclosed |
| US-20130017334-A1 | COATING COMPOSITION AND PROCESS FOR ITS PRODUCTION, AND PROCESS FOR FORMING COATING FILM BY USING THE COMPOSITION | ASAHI GLASS COMPANY, LIMITED (JP) | 2013-01-17 | — | — | US | disclosed |
| CN-102844388-A | Coating composition and production method for same, and formation method for coating film using same | ASAHI GLASS CO LTD | 2012-12-26 | — | — | CN | disclosed |
| EP-1863809-A2 | PYRAZOLOPYRIDINES AND ANALOGS THEREOF | Coley Pharmaceutical Group, Inc. (US) | 2007-12-12 | — | — | EP | disclosed |
| WO-2006107753-A2 | PYRAZOLOPYRIDINES AND ANALOGS THEREOF | COLEY PHARMACEUTICAL GROUP, INC. (US) | 2006-10-12 | — | — | WO | disclosed |