Tetrapropylammonium

Tetrapropylammonium

SCHEMBL5570488

CCCCC(=O)O.CCC[N+](CCC)(CCC)CCC

nearest known ligand 0.68

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 1/20 0.68
GPR84 Q9NQS5 7/20 0.65
PPARG P37231 7/20 0.65
PPARD Q03181 7/20 0.65
PPARA Q07869 7/20 0.65
HDAC11 Q96DB2 5/20 0.65
TSHR P16473 4/20 0.65
PTPN1 P18031 3/20 0.65
FABP4 P15090 3/20 0.65
ALDH1A1 P00352 2/20 0.65
TLR2 O60603 2/20 0.65
TDP1 Q9NUW8 2/20 0.65
KMT2A Q03164 2/20 0.65
ALOX15 P16050 2/20 0.65
HSD17B10 Q99714 2/20 0.65
SLC22A6 Q4U2R8 1/20 0.65
SLC22A8 Q8TCC7 1/20 0.65
MEN1 O00255 1/20 0.65
ESR1 P03372 1/20 0.65
PDE4A P27815 1/20 0.65

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrapropylammonium SCHEMBL28080499 0.93 GPR84 (0.77) AKR1B1GPR84PPARGPPARDPPARA
Stearic Acid SCHEMBL109615 0.93 GPR84 (0.77) AKR1B1GPR84PPARGPPARDPPARA
Tetrapropylammonium SCHEMBL107054 0.93 AKR1B1 (0.64) AKR1B1GPR84PPARGPPARDPPARA
Tetrapropylammonium SCHEMBL108159 0.93 AKR1B1 (0.64) AKR1B1GPR84PPARGPPARDPPARA
Tetrapropylammonium SCHEMBL106801 0.93 AKR1B1 (0.71) AKR1B1GPR84PPARGPPARDPPARA
Tetrapropylammonium SCHEMBL105338 0.93 AKR1B1 (0.71) AKR1B1GPR84PPARGPPARDPPARA
Tetrabuthylammonium SCHEMBL5574260 0.91 AKR1B1 (0.68) AKR1B1GPR84PPARGPPARDPPARA
Sebacic Acid SCHEMBL5874341 0.91 GPR84 (0.73) AKR1B1GPR84PPARGPPARDPPARA
Tetrapropylammonium SCHEMBL108659 0.87 SLC22A1 (0.56) AKR1B1GPR84PPARGPPARDPPARA
Valeric Acid SCHEMBL23121555 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed