Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1B1 | P15121 | 1/20 | 0.84 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.80 |
| ▸ | PPARG | P37231 | 7/20 | 0.80 |
| ▸ | PPARD | Q03181 | 7/20 | 0.80 |
| ▸ | PPARA | Q07869 | 7/20 | 0.80 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.80 |
| ▸ | TSHR | P16473 | 4/20 | 0.80 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.80 |
| ▸ | FABP4 | P15090 | 3/20 | 0.80 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.80 |
| ▸ | TLR2 | O60603 | 2/20 | 0.80 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.80 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.80 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.80 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.80 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.80 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.80 |
| ▸ | MEN1 | O00255 | 1/20 | 0.80 |
| ▸ | ESR1 | P03372 | 1/20 | 0.80 |
| ▸ | PDE4A | P27815 | 1/20 | 0.80 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Stearic Acid SCHEMBL109194 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Nonanoate SCHEMBL27415098 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Octanoic Acid SCHEMBL3118549 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Palmitic Acid SCHEMBL5155823 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Decanoic Acid SCHEMBL3106254 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Myristic Acid SCHEMBL5154031 | 0.97 | GPR84 (0.85) | AKR1B1GPR84PPARGPPARDPPARA | |
| Decanoic Acid SCHEMBL28987718 | 0.95 | GPR84 (0.81) | AKR1B1GPR84PPARGPPARDPPARA | |
| Hexanoate SCHEMBL1866591 | 0.95 | AKR1B1 (0.94) | AKR1B1GPR84PPARGPPARDPPARA | |
| Hexanoate SCHEMBL27503401 | 0.95 | — | — | |
| Hexanoate SCHEMBL8572669 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4089128-A1 | POLYISOCYANATE COMPOSITION AND CURED FILM | Asahi Kasei Kabushiki Kaisha (JP) | 2022-11-16 | — | — | EP | disclosed |
| CN-110183390-B | Preparation method of bio-based pentamethylene diisocyanate trimer | 中海油常州涂料化工研究院有限公司 | 2021-01-19 | — | — | CN | disclosed |
| CN-110183390-A | A kind of biology base pentamethylene diisocyanate trimer preparation method | 中海油常州涂料化工研究院有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-103936955-B | New trimer catalyst additives for improving foam processability | 气体产品与化学公司 | 2017-04-26 | — | — | CN | disclosed |
| CN-103936955-A | New trimer catalyst additives for improving foam processability | AIR PROD & CHEM | 2014-07-23 | — | — | CN | disclosed |
| CN-101070369-B | Novel trimer catalyst additives for improving foam processability | AIR PROD & CHEM | 2014-05-28 | — | — | CN | disclosed |
| CN-101070369-A | Novel trimer catalyst additives for improving foam processability | AIR PROD & CHEM (US) | 2007-11-14 | — | — | CN | disclosed |
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| CN-87102267-A | Electrolyte for electrolytic capacitor | — | 1987-10-07 | — | — | CN | disclosed |