SCHEMBL5571071

SCHEMBL5571071

Cl[Si](Cl)(Cl)CCCCCCCCCCCCCCCCCCOc1ccccc1.Cl[Si](Cl)(Cl)CCCCCCCCCCCCCCCCCCOc1ccccc1-c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.49
MAPK1 P28482 1/20 0.49
RAB9A P51151 1/20 0.49
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
HTR7 P34969 1/20 0.47
KDM4E B2RXH2 3/20 0.46
KCNA3 P22001 3/20 0.46
LMNA P02545 1/20 0.46
FFAR4 Q5NUL3 1/20 0.45
ADRB2 P07550 3/20 0.44
ALDH1A1 P00352 1/20 0.43
HTT P42858 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
ADRB1 P08588 1/20 0.43
HDAC3 O15379 1/20 0.42
HDAC4 P56524 1/20 0.42
HDAC1 Q13547 1/20 0.42
HDAC7 Q8WUI4 1/20 0.42
HDAC2 Q92769 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5575435 0.94 TP53 (0.54) TP53MAPK1RAB9AMEN1KMT2A
SCHEMBL10621676 0.88 TP53 (0.57) TP53MAPK1RAB9AMEN1KMT2A
SCHEMBL17476367 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL17476329 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL17476377 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL17476338 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL2685625 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL17476375 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL1497968 0.84 KCNA3 (0.64) KCNA3ALDH1A1HDAC3HDAC4HDAC1
SCHEMBL5574693 0.82 HDAC3 (0.54) MEN1KMT2AKDM4EKCNA3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7298013-B2 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure INFINEON TECHNOLOGIES AG (DE) 2007-11-20 US claimed
US-20060175603-A1 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure POLARIS INNOVATIONS LIMITED (IE) 2006-08-10 US claimed