SCHEMBL5571187

SCHEMBL5571187

c1ccc(-c2ccc(-c3nnco3)cc2)cc1

nearest known ligand 0.91

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ NOTUM Q6P988 16/20 0.91
▸ TLR8 Q9NR97 1/20 0.70
▸ KDM4E B2RXH2 1/20 0.55
▸ ALDH1A1 P00352 1/20 0.55
▸ LMNA P02545 1/20 0.55
▸ MAPT P10636 1/20 0.55
▸ HTT P42858 1/20 0.55
▸ TSHR P16473 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL22577775 0.98 NOTUM (0.95) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL9555 0.96 NOTUM (1.00) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL2610163 0.91 NOTUM (0.75) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL17694561 0.89 NOTUM (0.78) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL28491308 0.86 NOTUM (0.68) NOTUMTLR8KDM4EALDH1A1LMNA
Biphenyl SCHEMBL19065169 0.86 NOTUM (0.68) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL11232897 0.86 NOTUM (0.74) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL3283250 0.84 NOTUM (0.66) NOTUMTLR8ALDH1A1TSHR
SCHEMBL3970760 0.84 NOTUM (0.78) NOTUMTLR8KDM4EALDH1A1LMNA
SCHEMBL28317333 0.83 NOTUM (0.69) NOTUMTLR8KDM4EALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114671969-B Polystyrene scintillating particles and preparation method thereof 中国辐射防护研究院 2024-04-12 — — CN claimed
CN-114685704-A Plastic scintillation microsphere and synthetic method thereof 中国辐射防护研究院 2022-07-01 — — CN claimed
CN-114672103-A Plastic scintillation microsphere and preparation method thereof 中国辐射防护研究院 2022-06-28 — — CN claimed
CN-114671969-A Polystyrene scintillation particle and preparation method thereof 中国辐射防护研究院 2022-06-28 — — CN claimed
WO-2022085097-A1 DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME シャープ株式会社 2022-04-28 — — WO claimed
CN-113185628-A Polystyrene scintillation microsphere and preparation method thereof 中国辐射防护研究院 2021-07-30 — — CN claimed
EP-3676305-A1 PLASTIC SCINTILLATOR BASED ON AN ORGANIC POLYADDITION PRODUCT Target Systemelektronik GmbH & Co. KG (DE) 2020-07-08 — — EP claimed
EP-0863557-B1 Method of fabricating electroluminescent devices AVAGO TECH ECBU IP SG PTE LTD (SG) 2007-11-28 — — EP claimed
EP-1394871-A2 Electroluminescent devices Agilent Technologies, Inc. (a Delaware corporation) (US) 2004-03-03 — — EP claimed
US-5965280-A Patterned polymer electroluminescent devices based on microlithographic processes HEWLETT-PACKARD COMPANY (US) 1999-10-12 — — US claimed
EP-0863557-A2 Electroluminescent devices Hewlett-Packard Company (US) 1998-09-09 — — EP claimed
CN-114671969-B Polystyrene scintillating particles and preparation method thereof 中国辐射防护研究院 2024-04-12 — — CN disclosed
CN-114685704-A Plastic scintillation microsphere and synthetic method thereof 中国辐射防护研究院 2022-07-01 — — CN disclosed
CN-114671969-A Polystyrene scintillation particle and preparation method thereof 中国辐射防护研究院 2022-06-28 — — CN disclosed
CN-114672103-A Plastic scintillation microsphere and preparation method thereof 中国辐射防护研究院 2022-06-28 — — CN disclosed
EP-1517972-A1 METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD Showa Denko K.K. (JP) 2005-03-30 — — EP disclosed
EP-1394871-A2 Electroluminescent devices Agilent Technologies, Inc. (a Delaware corporation) (US) 2004-03-03 — — EP disclosed
WO-2003104350-A1 METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD SHOWA DENKO K.K. (JP) 2003-12-18 — — WO disclosed
US-5965280-A Patterned polymer electroluminescent devices based on microlithographic processes HEWLETT-PACKARD COMPANY (US) 1999-10-12 — — US disclosed
EP-0863557-A2 Electroluminescent devices Hewlett-Packard Company (US) 1998-09-09 — — EP disclosed
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