SCHEMBL557310

SCHEMBL557310

CC(O)CCCN(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22894143 1.00
SCHEMBL7454184 0.92 ALDH1A1 (0.50)
SCHEMBL10871343 0.90 ALDH1A1 (0.55)
SCHEMBL4590729 0.90 ALDH1A1 (0.55)
SCHEMBL10441028 0.90 ALDH1A1 (0.55)
Ammonia Solution, Strong SCHEMBL3819671 0.90 ALDH1A1 (0.48)
SCHEMBL8386429 0.85 CA12 (0.50)
SCHEMBL22166093 0.85 HTR2A (0.37)
SCHEMBL9865 0.82
SCHEMBL19617368 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109153187-B Three-dimensional object precursor treatment agent composition 花王株式会社 2021-04-30 CN claimed
US-20190185634-A1 THREE-DIMENSIONAL OBJECT PRECURSOR TREATMENT COMPOSITION KAO CORPORATION (JP) 2019-06-20 US claimed
EP-3459717-A1 THREE-DIMENSIONAL OBJECT PRECURSOR TREATMENT COMPOSITION Kao Corporation (JP) 2019-03-27 EP claimed
CN-109153187-A Three-dimension object precursor agent composition 花王株式会社 2019-01-04 CN claimed
US-6372874-B1 SOLVENT-FREE HYDROSILATION OF UNSATURATED POLYETHERS WITH ORGANOHYDROGENSILOXANES IN THE PRESENCE OF HYDROXYL, CARBONYL, OR ETHER-FUNCTIONAL AMINES AS BUFFERS FOR THE METAL HYDROSILATION CATALYSTS; BY-PRODUCT INHIBITION; KINETICS CROMPTON CORPORATION 2002-04-16 US claimed
US-12630570-B2 Organometallic adduct compound and method of manufacturing integrated circuit device by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-19 US disclosed
CN-115362157-B Zinc compound, raw material for forming thin film, and method for producing same 株式会社ADEKA 2026-05-15 CN disclosed
EP-4130010-B1 ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-04-29 EP disclosed
EP-4067365-B1 COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-03-25 EP disclosed
US-12577660-B2 Compound, thin-film forming raw material, thin-film, and method of producing thin-film ADEKA CORPORATION (JP) 2026-03-17 US disclosed
US-20260055506-A1 HALOGEN COMPOUND ADEKA CORPORATION (JP) 2026-02-26 US disclosed
US-20260055507-A1 THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2026-02-26 US disclosed
EP-0934925-B1 Process for the preparation of beta-alkoxy nitriles BASF AG (DE) 2002-09-25 EP disclosed
US-6187957-B1 CATALYTIC AMINATION OF ALCOHOLS, ALDEHYDES OR KETONES IN THE PRESENCE OF HYDROGEN; THE AMINES ARE USED AS BLOWING AGENTS FOR POLYURETHANE PRODUCTION, CATALYSTS FOR THE PREPARATION OF SURFACTANTS AND POLYMERS, INTERMEDIATES FOR DYES BASF AKTIENGESELLSCHAFT (DE) 2001-02-13 US disclosed
US-6180322-B1 DEVELOPING THIN FILM, MADE FROM RADIATION SENSITIVE COMPOSITION COMPRISING ALKALI-SOLUBLE RESIN AND RADIATION SENSITIVE COMPOUND AND HAVING LATENT IMAGE PATTERN, WITH ALKALINE DEVELOPING SOLUTION TO FORM THIN FILM PATTERN WHEREIN JSR CORPORATION (JP) 2001-01-30 US disclosed
US-6057442-A Preparation of amines BASF AKTIENGESELLSCHAFT (DE) 2000-05-02 US disclosed
CN-1245162-A Process for preparing amine BASF AG (DE) 2000-02-23 CN disclosed
EP-0934925-A1 Process for the preparation of beta-alkoxy nitriles BASF AKTIENGESELLSCHAFT (DE) 1999-08-11 EP disclosed
CN-1215719-A Preparation of amines BASF AG (DE) 1999-05-05 CN disclosed
US-5608113-A Process for preparation of diamines by catalytic amination of aminoalcohols BASF AKTIENGESELLSCHAFT (DE) 1997-03-04 US disclosed