⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13430609 | 1.00 | — | — | |
| SCHEMBL929338 | 1.00 | — | — | |
| SCHEMBL706690 | 0.97 | — | — | |
| SCHEMBL31299139 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL5570788 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL5574602 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL31299153 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL9253777 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL3149888 | 0.92 | TSHR (0.40) | — | |
| SCHEMBL31299234 | 0.92 | TSHR (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10995268-B2 | Etching composition effective to selectively wet etch a silicon nitride film | LTCAM CO., LTD. (KR) | 2021-05-04 | — | — | US | disclosed |
| CN-110551503-B | Composition for wet etching silicon nitride | LTCAM株式会社 | 2021-04-16 | — | — | CN | disclosed |
| CN-110551503-A | Composition for wet etching silicon nitride | LTCAM CO LTD | 2019-12-10 | — | — | CN | disclosed |
| US-9074032-B2 | Membranes based on polyvinyl alcohol | WACKER CHEMIE AG (DE) | 2015-07-07 | — | — | US | disclosed |
| EP-2414411-B1 | MEMBRANES BASED ON POLYVINYL ALCOHOL | WACKER CHEMIE AG (DE) | 2013-02-20 | — | — | EP | disclosed |
| US-20120031843-A1 | Membranes based on polyvinyl alcohol | WACKER CHEMIE AG (DE) | 2012-02-09 | — | — | US | disclosed |
| EP-1619692-B1 | PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM | SEKISUI CHEMICAL CO LTD (JP) | 2011-02-09 | — | — | EP | disclosed |
| US-20070213495-A1 | Proton conducting membrane, method for producing the same, and fuel cell using the same | SEKISUI CHEMICAL COL.,LTD. (JP) | 2007-09-13 | — | — | US | disclosed |
| US-7214756-B2 | Heat resistance, durability, dimensional stability and fuel barrier characteristics | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20060219981-A1 | Proton conductive film, process for producing the same, and fuel cell employing the proton-conductive film | SEKISUI CHEMICAL CO., LTD. (JP) | 2006-10-05 | — | — | US | disclosed |
| US-20060035129-A1 | Proton conducting membrane, method for producing the same and fuel cell using the same | SEKISUI CHEMICAL CO., LTD. (JP) | 2006-02-16 | — | — | US | disclosed |
| EP-1619692-A1 | PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM | SEKISUI CHEMICAL CO., LTD. (JP) | 2006-01-25 | — | — | EP | disclosed |
| EP-1592025-A1 | PROTON CONDUCTING FILM, METHOD FOR PRODUCING THE SAME, AND FUEL CELL USING THE SAME | SEKISUI CHEMICAL CO., LTD. (JP) | 2005-11-02 | — | — | EP | disclosed |
| EP-1441365-A1 | PROTON CONDUCTING MEMBRANE-PROCESS FOR ITS PRODUCTION-AND FUEL CELLS MADE BY USING THE SAME | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-20040062970-A1 | Heat resistance, durability, dimensional stability and fuel barrier characteristics | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-04-01 | — | — | US | disclosed |