SCHEMBL557723

SCHEMBL557723

O=CC(O)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL9318832 0.95
SCHEMBL9124934 0.79
Hydroquinone SCHEMBL11515797 0.77 ALDH5A1 (0.50)
SCHEMBL324856 0.76
SCHEMBL11831549 0.76
SCHEMBL9070712 0.76
SCHEMBL1613708 0.74
SCHEMBL7930151 0.71
SCHEMBL7930149 0.71
SCHEMBL8208776 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3116 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12612523-B2 Fireproof coating material WeiFang Jia Cheng Digital Materials Co., Ltd. (CN) 2026-04-28 US claimed
US-20240343921-A1 FIREPROOF COATING MATERIAL WeiFang Jia Cheng Digital Materials Co., Ltd. (CN) 2024-10-17 US claimed
EP-4335909-A1 FIRE-RESISTANT COATING MATERIAL Weifang Jia Cheng Digital Materials Co., Ltd. (CN) 2024-03-13 EP claimed
CN-111615666-B Method for producing planar polymer stacks 阿科玛法国公司 2024-02-06 CN claimed
WO-2024021366-A1 FIRE-RESISTANT COATING MATERIAL 潍坊佳诚数码材料有限公司 2024-02-01 WO claimed
US-11868044-B2 Prepolymer composition intended to form a contrast layer and method for structuring an interface material ARKEMA FRANCE (FR) 2024-01-09 US claimed
EP-3142989-B1 STABILISED SETTING AND HARDENING ACCELERATOR FOR HYDRAULIC BINDING AGENTS SIKA TECH AG (CH) 2023-12-27 EP claimed
EP-3233779-B1 NOVEL PROCESS FOR PREPARING SYNTHESIS INTERMEDIATES USING PRODUCTS OF NATURAL ORIGIN AND USE OF THE INTERMEDIATES OBTAINED CENTRE NAT RECH SCIENT (FR) 2023-07-19 EP claimed
EP-4169898-A1 DEHYDRATION AND CRACKING OF ALPHA-, BETA-DIHYDROXY CARBONYL COMPOUNDS TO LACTIC ACID AND OTHER PRODUCTS Archer Daniels Midland Company (US) 2023-04-26 EP claimed
US-20230076686-A1 LOW ODOR HIGH LEVEL DISINFECTANT MEDIVATORS INC. 2023-03-09 US claimed
US-4152155-A DRY PROCESSING, HIGH SPEED, NONSILVER PHOTOGRAPHY EASTMAN KODAK COMPANY (US) 1979-05-01 US claimed
US-4144062-A Organotellurium (II) and (IV) compounds in heat-developable photographic materials and process EASTMAN KODAK COMPANY (US) 1979-03-13 US claimed
US-4140649-A ANIONIC AND NONIONIC SURFACTANTS, REDUCING AND SEQUESTERING AGENTS, PRESERVATIVES, BUFFERS BOSSERT EDUARD 1979-02-20 US claimed
US-4133687-A Photographic elements having hydrophilic colloid layers containing compounds having activator precursors and hydrophobic developing agents uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1979-01-09 US claimed
US-4030931-A PHOTOGRAPHY, SILVER HALIDES FUJI PHOTO FILM CO., LTD. (JA) 1977-06-21 US claimed
US-4021249-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US claimed
US-4014698-A ACIDS, IODIDE COMPOUNDS, OXIDIZERS, DIAZINE COMPOUND CIBA-GEIGY AG (CH) 1977-03-29 US claimed
US-4009039-A Heat developable light-sensitive oxazoline containing element FUJI PHOTO FILM CO., LTD. (JA) 1977-02-22 US claimed
US-4003749-A Heat-developable light-sensitive materials using the reaction product of a organic silver salt an a N-halo-oxazolidinone FUJI PHOTO FILM CO., LTD. (JA) 1977-01-18 US claimed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US claimed