SCHEMBL5599239

SCHEMBL5599239

C=C(C)C.O=C1C=CC(=O)N1c1ccccc1

nearest known ligand 0.75

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 16/20 0.75
FAAH O00519 6/20 0.59
HSP90AA1 P07900 4/20 0.53
PKM P14618 2/20 0.53
ALDH1A1 P00352 1/20 0.53
HTT P42858 1/20 0.53
ATM Q13315 1/20 0.53
MAPK1 P28482 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
DDAH1 O94760 1/20 0.52
BCHE P06276 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL9203835 0.90 MGLL (0.67) MGLLFAAHHSP90AA1PKMALDH1A1
Acetone SCHEMBL29280757 0.89 MGLL (0.78) MGLLFAAHHSP90AA1PKMALDH1A1
SCHEMBL17534919 0.89 MGLL (0.64) MGLLFAAHHSP90AA1PKMALDH1A1
SCHEMBL8166813 0.89 MGLL (0.64) MGLLFAAHHSP90AA1PKMALDH1A1
SCHEMBL17534927 0.89 MGLL (0.64) MGLLFAAHHSP90AA1PKMALDH1A1
SCHEMBL7136050 0.87 MGLL (0.62) MGLLFAAHHSP90AA1PKMALDH1A1
Ethylene SCHEMBL28146859 0.87 MGLL (0.90) MGLLFAAHHSP90AA1PKMALDH1A1
Formaldehyde SCHEMBL27804450 0.87 MGLL (0.90) MGLLFAAHHSP90AA1PKMALDH1A1
SCHEMBL8920586 0.87 MGLL (1.00) MGLLFAAHHSP90AA1PKMALDH1A1
Benzene SCHEMBL28088808 0.87 MGLL (1.00) MGLLFAAHHSP90AA1PKMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100540598-C The resin combination that is used for blooming, blooming and production method thereof TOSOH CORP (JP) 2009-09-16 CN claimed
CN-1569949-A Resin composition for optical film, optical film and process for producing the optical film TOSOH CORP (JP) 2005-01-26 CN claimed
CN-100540598-C The resin combination that is used for blooming, blooming and production method thereof TOSOH CORP (JP) 2009-09-16 CN disclosed
CN-1965021-A Oriented film, process for producing the same and laminate thereof TEIJIN DUPONT FILMS JAPAN LTD (JP) 2007-05-16 CN disclosed
EP-1403297-B1 Transparent heat-resistant resin optical material and film TOSOH CORP (JP) 2007-03-28 EP disclosed
US-7001967-B2 Resin with excellent heat resistance and dynamic characteristics, having negative birefringence and exhibiting a high refractive index and a high Abbe number, especially optical compensating members such as films, sheets and TOSOH CORPORATION (JP) 2006-02-21 US disclosed
CN-1569949-A Resin composition for optical film, optical film and process for producing the optical film TOSOH CORP (JP) 2005-01-26 CN disclosed
US-20040063887-A1 Transparent heat-resistant resin optical material and film TOSOH CORPORATION (JP) 2004-04-01 US disclosed
EP-1403297-A1 Transparent heat-resistant resin optical material and film Tosoh Corporation (JP) 2004-03-31 EP disclosed