Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.62 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.50 |
| ▸ | PDE4A | P27815 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.37 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL3270603 | 1.00 | TDP1 (0.62) | TDP1TP53OR51E2PDE4ATSHR | |
| Propylene Glycol SCHEMBL17841687 | 1.00 | TDP1 (0.62) | TDP1TP53OR51E2PDE4ATSHR | |
| Propylene Glycol SCHEMBL25260513 | 0.92 | TDP1 (0.53) | TDP1TP53OR51E2PDE4ATSHR | |
| Lactic Acid SCHEMBL692985 | 0.88 | TP53 (0.69) | TDP1TP53OR51E2PDE4ATSHR | |
| Lactic Acid SCHEMBL8850838 | 0.88 | TP53 (0.69) | TDP1TP53OR51E2PDE4ATSHR | |
| Propylene Glycol SCHEMBL4337036 | 0.87 | TDP1 (0.71) | TDP1TP53OR51E2PDE4ATSHR | |
| Propylene Glycol SCHEMBL28574118 | 0.87 | TDP1 (0.71) | TDP1TP53OR51E2PDE4ATSHR | |
| Propylene Glycol SCHEMBL29352119 | 0.87 | — | — | |
| Propylene Glycol SCHEMBL320017 | 0.87 | — | — | |
| Glycerin SCHEMBL2442337 | 0.85 | LMNA (0.53) | TDP1TP53OR51E2PDE4ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7297463-B2 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-20 | — | — | US | claimed |
| US-20050271977-A1 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-12-08 | — | — | US | claimed |
| US-6743881-B2 | HIGH RESOLUTION MICROLITHOGRAPHY; POST EXPOSURE DELAY STABILITY; HEAT RESISTANCE; TERPOLYMER CONTAINING STYRENIC, P-VINYLPHENOL AND VINYLBENZENE CONTAINING BRANCHED ESTER SUBSTITUTION | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-06-01 | — | — | US | claimed |
| US-20030181629-A1 | Chemically amplified resist and a resist composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-09-25 | — | — | US | claimed |
| WO-2001079934-A1 | CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2001-10-25 | — | — | WO | claimed |
| CN-118930834-A | Polycarbonate oligomer having unsaturated double bond, process for producing the same, curable composition, and process for producing low dielectric cured product | 上纬创新育成股份有限公司 | 2024-11-12 | — | — | CN | disclosed |
| CN-106967116-B | Unimolecule intumescent alkyl phosphinate fire retardant and preparation method thereof | 江汉大学 | 2019-04-19 | — | — | CN | disclosed |
| CN-106967116-A | Unimolecule intumescent alkyl phosphinate fire retardant and preparation method thereof | 江汉大学 | 2017-07-21 | — | — | CN | disclosed |
| US-7297463-B2 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20050271977-A1 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-12-08 | — | — | US | disclosed |
| US-6767687-B1 | CAN FORM FINER PATTERNS ON A SUBSTRATE IN A MICRO-LITHOGRAPHY PROCESS SUITABLE FOR MICRO-PROCESSING OF SEMICONDUCTORS | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-07-27 | — | — | US | disclosed |
| US-6743881-B2 | HIGH RESOLUTION MICROLITHOGRAPHY; POST EXPOSURE DELAY STABILITY; HEAT RESISTANCE; TERPOLYMER CONTAINING STYRENIC, P-VINYLPHENOL AND VINYLBENZENE CONTAINING BRANCHED ESTER SUBSTITUTION | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-06-01 | — | — | US | disclosed |
| US-20030181629-A1 | Chemically amplified resist and a resist composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-09-25 | — | — | US | disclosed |