Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.42 |
| ▸ | PTPRC | P08575 | 1/20 | 0.42 |
| ▸ | S100A4 | P26447 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7616610 | 0.83 | CYP1A2 (0.53) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL31207336 | 0.83 | CYP1A2 (0.53) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL11327234 | 0.83 | TSHR (0.50) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL28247951 | 0.80 | CYP1A2 (0.50) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL3766379 | 0.80 | ALDH1A1 (0.53) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL27859392 | 0.80 | CYP1A2 (0.50) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL31618608 | 0.80 | ALDH1A1 (0.53) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL10796481 | 0.80 | CYP1A2 (0.50) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL11034569 | 0.80 | CYP1A2 (0.59) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 | |
| SCHEMBL27648762 | 0.80 | CYP1A2 (0.54) | CYP1A2ALDH1A1TSHRHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240200070-A1 | EXPANDING THE CHEMICAL SUBSTRATES FOR GENETIC CODE REPROGRAMMING | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS | 2024-06-20 | — | — | US | disclosed |
| US-11814621-B2 | Expanding the chemical substrates for genetic code reprogramming | NORTHWESTERN UNIVERSITY (US) | 2023-11-14 | — | — | US | disclosed |
| US-20230295613-A1 | LONG CHAIN CARBON AND CYCLIC AMINO ACIDS SUBSTRATES FOR GENETIC CODE REPROGRAMMING | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS | 2023-09-21 | — | — | US | disclosed |
| CN-109423309-B | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display assembly | 奇美实业股份有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-115867648-A | Extension of chemical substrates for genetic code reprogramming to include long chain carbons and cyclic amino acids | 西北大学 | 2023-03-28 | — | — | CN | disclosed |
| EP-4103734-A2 | LONG CHAIN CARBON AND CYCLIC AMINO ACIDS SUBSTRATES FOR GENETIC CODE REPROGRAMMING | Northwestern University (US) | 2022-12-21 | — | — | EP | disclosed |
| WO-2021221760-A2 | EXPANDING THE CHEMICAL SUBSTRATES FOR GENETIC CODE REPROGRAMMING TO INCLUDE LONG CHAIN CARBON AND CYCLIC AMINO ACIDS | NORTHWESTERN UNIVERSITY (US) | 2021-11-04 | — | — | WO | disclosed |
| US-20210230586-A1 | Expanding the Chemical Substrates for Genetic Code Reprogramming | BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS, THE | 2021-07-29 | — | — | US | disclosed |
| WO-2020128675-A1 | SUBSTITUTED 1,2,4-OXADIAZOLE, ITS APPLICATION AND A PHARMACEUTICAL PREPARATION COMPRISING IT | SVENOX PHARMACEUTICALS LLC (US) | 2020-06-25 | — | — | WO | disclosed |
| WO-2020040840-A2 | EXPANDING THE CHEMICAL SUBSTRATES FOR GENETIC CODE REPROGRAMMING | NORTHWESTERN UNIVERSITY (US) | 2020-02-27 | — | — | WO | disclosed |
| EP-1239332-B1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-02-21 | — | — | EP | disclosed |
| US-20060160014-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2006-07-20 | — | — | US | disclosed |
| US-20050287469-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2005-12-29 | — | — | US | disclosed |
| EP-1560069-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1548499-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-6902875-B2 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-07 | — | — | US | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| US-20030113657-A1 | Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | MERCK PATENT GMBH (DE) | 2003-06-19 | — | — | US | disclosed |
| EP-1239332-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2002-09-11 | — | — | EP | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |