Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.69 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 4/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | DHODH | Q02127 | 1/20 | 0.49 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.49 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | FBP1 | P09467 | 1/20 | 0.47 |
| ▸ | GLA | P06280 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.45 |
| ▸ | F2 | P00734 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16568719 | 0.82 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL581982 | 0.82 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL805622 | 0.82 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL874087 | 0.82 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL759655 | 0.82 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL37034 | 0.82 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL41906 | 0.82 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL759656 | 0.82 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL2532810 | 0.82 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRAB9A | |
| SCHEMBL23458002 | 0.81 | AKR1C3 (0.73) | AKR1C3ALDH1A1TSHRHTTRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7612145-B2 | Composite material containing non-functional aromatic end group-containing polymer | ROHM AND HAAS COMPANY (US) | 2009-11-03 | — | — | US | claimed |
| EP-0745621-B1 | Polymerisable composition based on thio(meth)acrylate monomer, transparent polymer compositions and their optical use | ESSILOR INT (FR) | 1998-04-15 | — | — | EP | claimed |
| EP-0745621-A1 | Polymerisable composition based on thio(meth)acrylate monomer, transparent polymer compositions and their optional use | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 1996-12-04 | — | — | EP | claimed |
| EP-1579521-B1 | CURABLE COMPOSITION, CURED PRODUCT THEREOF, MOLDED PRODUCT THEREOF AND USE AS FUEL CELL SEPARATOR | SHOWA DENKO KK (JP) | 2018-04-11 | — | — | EP | disclosed |
| US-20160017076-A1 | CURABLE COMPOSITION, TRANSPARENT HEAT-RESISTANT MATERIAL, AND USE THEREOF | SHOWA DENKO K.K. (JP) | 2016-01-21 | — | — | US | disclosed |
| US-8747703-B2 | Electrically conducting curable resin composition, cured product thereof and method for producing the same | SHOWA DENKO K.K. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8609318-B2 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | JSR CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8518524-B2 | Transparent composite material | SHOWA DENKO K.K. (JP) | 2013-08-27 | — | — | US | disclosed |
| US-8460501-B2 | Cured film and method for production thereof | SHOWA DENKO K.K. (JP) | 2013-06-11 | — | — | US | disclosed |
| US-8119039-B2 | Transparent conductive substrate | SHOWA DENKO K.K. (JP) | 2012-02-21 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20080078976-A1 | Composite material containing non-functional aromatic end group-containing polymer | ROHM AND HAAS COMPANY | 2008-04-03 | — | — | US | disclosed |
| US-7338730-B2 | Conductive curable resin composition and separator for fuel cell | SHOWA DENKO K.K. (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20060116466-A1 | Curable composition, cured product thereof, molded product thereof and use as fuel cell separator | SHOWA DENKO K.K. (JP) | 2006-06-01 | — | — | US | disclosed |
| US-20050171270-A1 | Conductive curable resin composition and separator for fuel cell | SHOWA DENKO K.K. | 2005-08-04 | — | — | US | disclosed |
| US-6472488-B2 | MONOMERS CONTAIN THIO-CONTAINING HETEROCYCLES; USE IN MANUFACTURE OF WAVEGUIDES, OPTICAL FIBERS AND SPECTACLE LENSES | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2002-10-29 | — | — | US | disclosed |
| EP-0745621-B1 | Polymerisable composition based on thio(meth)acrylate monomer, transparent polymer compositions and their optical use | ESSILOR INT (FR) | 1998-04-15 | — | — | EP | disclosed |
| EP-0745620-B1 | Polymerisable compositions based on thio(meth)acrylate monomers, polymers having low yellowness index made from these compositions and ophthalmic lenses made therefrom | ESSILOR INT (FR) | 1997-10-29 | — | — | EP | disclosed |
| EP-0745621-A1 | Polymerisable composition based on thio(meth)acrylate monomer, transparent polymer compositions and their optional use | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 1996-12-04 | — | — | EP | disclosed |
| EP-0745620-A1 | Polymerisable compositions based on thio(meth)acrylate monomers, polymers having low yellowness index made from these compositions and ophthalmic lenses made therefrom | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 1996-12-04 | — | — | EP | disclosed |