Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | XDH | P47989 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.48 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | CNR1 | P21554 | 1/20 | 0.48 |
| ▸ | CNR2 | P34972 | 1/20 | 0.48 |
| ▸ | PPARG | P37231 | 1/20 | 0.48 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | PPARD | Q03181 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL9577264 | 0.98 | XDH (0.52) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL11402734 | 0.96 | XDH (0.47) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Allylbenzene SCHEMBL8150958 | 0.93 | CA1 (0.50) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Allylbenzene SCHEMBL10528767 | 0.93 | CA1 (0.50) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL30870 | 0.91 | XDH (0.58) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL10565597 | 0.89 | XDH (0.56) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL11043594 | 0.89 | XDH (0.56) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL10511637 | 0.89 | XDH (0.56) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL7924978 | 0.89 | XDH (0.56) | XDHALDH1A1KDM4EMEN1ALDH2 | |
| Chavicol SCHEMBL5489418 | 0.89 | XDH (0.56) | XDHALDH1A1KDM4EMEN1ALDH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105143160-A | Bridged alkaline earth metal alkyl phenates | LUBRIZOL CORP | 2015-12-09 | — | — | CN | claimed |
| EP-3606898-A1 | COMPOSITIONS COMPRISING HYDROQUINONE AND CATECHOL, METHOD FOR PREPARING THESE COMPOSITIONS | Rhodia Operations (FR) | 2020-02-12 | — | — | EP | disclosed |
| CN-110003457-A | The manufacturing method of carbonate resin, its manufacturing method, resin varnish and plywood containing allyl | 群荣化学工业株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-105143160-A | Bridged alkaline earth metal alkyl phenates | LUBRIZOL CORP | 2015-12-09 | — | — | CN | disclosed |
| CN-104871088-A | Photosensitive resin composition and photosensitive film using same | HITACHI CHEMICAL CO LTD | 2015-08-26 | — | — | CN | disclosed |
| CN-104865797-A | Photosensitive resin composition, photosensitive element using the same, forming method of etching-resist pattern, and manufacturing method of touch panel | HITACHI CHEMICAL CO LTD | 2015-08-26 | — | — | CN | disclosed |
| CN-104730864-A | Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing touch panel | HITACHI CHEMICAL CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-102132212-B | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-08-28 | — | — | CN | disclosed |
| CN-102257431-B | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-06-26 | — | — | CN | disclosed |
| CN-101855596-B | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-22 | — | — | CN | disclosed |
| CN-103091987-A | Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-102257431-A | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-102132212-A | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2011-07-20 | — | — | CN | disclosed |
| CN-101855596-A | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2010-10-06 | — | — | CN | disclosed |
| EP-1482791-A4 | ANTIMICROBIAL THERAPEUTIC COMPOSITIONS AND METHODS OF USE | NINKOV DUSAN DR (US) | 2007-04-04 | — | — | EP | disclosed |
| US-6921539-B2 | Antimicrobial therapeutic compositions and method of use | THE GOVERMENT OF REPUBLIKA SRPSKA (BA) | 2005-07-26 | — | — | US | disclosed |
| US-20050053678-A1 | Methods and compositions for betel nut chewing gum | HERBALSCIENCE NUTRACEUTICALS, INC. | 2005-03-10 | — | — | US | disclosed |
| EP-1482791-A1 | ANTIMICROBIAL THERAPEUTIC COMPOSITIONS AND METHODS OF USE | Pharmessen Scientific, Inc. (US) | 2004-12-08 | — | — | EP | disclosed |
| US-20030176364-A1 | Antimicrobial therapeutic compositions and methods of use | THE GOVERMENT OF REPUBLIKA SRPSKA (BA) | 2003-09-18 | — | — | US | disclosed |
| WO-2003069993-A1 | ANTIMICROBIAL THERAPEUTIC COMPOSITIONS AND METHODS OF USE | PHARMESSEN SCIENTIFIC, INC. (US) | 2003-08-28 | — | — | WO | disclosed |