Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5616263

CCNC(=N)N.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.39

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.37
F2 P00734 2/20 0.33
PRSS1 P07477 2/20 0.33
PRSS2 P07478 2/20 0.33
PRSS3 P35030 2/20 0.33
EPHX1 P07099 1/20 0.32
KDM4E B2RXH2 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
BLM P54132 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
HDAC4 P56524 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL11815400 0.85 ALOX15 (0.47) ALOX15KDM4ECYP2D6CYP2C19BLM
Sulfuric Acid SCHEMBL6049589 0.85 ALOX15 (0.47) ALOX15KDM4ECYP2D6CYP2C19BLM
Trifluoromethanesulfonic Acid SCHEMBL5616020 0.85 ALOX15 (0.42) ALOX15F2PRSS1PRSS2PRSS3
Sulfuric Acid SCHEMBL8671837 0.83 ALOX15 (0.46) ALOX15KDM4ECYP2D6CYP2C19BLM
Sulfuric Acid SCHEMBL8671832 0.79 MEN1 (0.39) ALOX15KDM4ECYP2D6CYP2C19BLM
Trifluoromethanesulfonic Acid SCHEMBL5177368 0.79 F2 (0.38) F2PRSS1PRSS2PRSS3KDM4E
SCHEMBL350124 0.78
Sulfuric Acid SCHEMBL8671834 0.77 ALOX15 (0.36) ALOX15KDM4ECYP2D6CYP2C19BLM
Hydrochloric Acid SCHEMBL2949942 0.75
Bromide SCHEMBL5248506 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114787298-A Two-component (2K) curable adhesive composition 汉高股份有限及两合公司 2022-07-22 CN disclosed
WO-2007107152-A2 DEPOSITION OF NANOSCALE METALS, SEMIMETALS AND COMPOUNDS OF SAID METALS AND/OR SEMIMETALS ON THE BOUNDARY SURFACE BETWEEN A LOW TEMPERATURE DISCHARGE AND AN IONIC LIQUID JUSTUS-LIEBIG-UNIVERSITÄT GIESSEN (DE) 2007-09-27 WO disclosed