⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5311881 | 0.88 | — | — | |
| SCHEMBL8665742 | 0.88 | MEN1 (0.67) | — | |
| SCHEMBL5311885 | 0.88 | MEN1 (0.67) | — | |
| SCHEMBL5617366 | 0.88 | MEN1 (0.67) | — | |
| SCHEMBL1476437 | 0.88 | — | — | |
| SCHEMBL31709992 | 0.87 | MEN1 (0.86) | — | |
| SCHEMBL9093617 | 0.87 | MEN1 (0.86) | — | |
| SCHEMBL136652 | 0.87 | — | — | |
| SCHEMBL14916717 | 0.87 | MEN1 (0.86) | — | |
| SCHEMBL23398193 | 0.80 | MEN1 (0.75) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7172269-B2 | Resistor shapes for heating devices on an integrated circuit | AVAGO TECHNOLOGIES FIBER IP (SINGAPORE) PTE. LTD. (SG) | 2007-02-06 | — | — | US | disclosed |
| US-7044823-B2 | Method of making a tunneling emitter | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2006-05-16 | — | — | US | disclosed |
| US-6911768-B2 | Tunneling emitter with nanohole openings | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2005-06-28 | — | — | US | disclosed |
| US-20050110001-A9 | TUNNELING EMITTER WITH NANOHOLE OPENINGS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMTED (TW) | 2005-05-26 | — | — | US | disclosed |
| US-20050104918-A1 | Resistor shapes for heating devices on an integrated circuit | AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (SG) | 2005-05-19 | — | — | US | disclosed |
| US-20040222729-A1 | Tunneling emitter | CHEN ZHIZHANG (US) | 2004-11-11 | — | — | US | disclosed |
| US-20040211975-A1 | Method of making a tunneling emitter | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-10-28 | — | — | US | disclosed |
| EP-1384244-B1 | TUNNELING EMITTER | HEWLETT PACKARD CO (US) | 2004-10-27 | — | — | EP | disclosed |
| US-6806488-B2 | Tunneling emitters and method of making | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2004-10-19 | — | — | US | disclosed |
| US-6781146-B2 | Annealed tunneling emitter | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2004-08-24 | — | — | US | disclosed |
| EP-1406284-A2 | Tunneling emitter with nanohole openings | Hewlett-Packard Development Company, L.P. (US) | 2004-04-07 | — | — | EP | disclosed |
| EP-1384244-A2 | TUNNELING EMITTER | Hewlett-Packard Company (US) | 2004-01-28 | — | — | EP | disclosed |
| US-20030168956-A1 | Tunneling emitters and method of making | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-09-11 | — | — | US | disclosed |
| US-20030089900-A1 | Tunneling emitter with nanohole openings | CHEN ZHIZHANG (US) | 2003-05-15 | — | — | US | disclosed |
| EP-1308980-A2 | Tunneling emitters and method of making | Hewlett-Packard Company (US) | 2003-05-07 | — | — | EP | disclosed |
| US-6558968-B1 | Method of making an emitter with variable density photoresist layer | HEWLETT-PACKARD DEVELOPMENT COMPANY | 2003-05-06 | — | — | US | disclosed |
| US-20030080330-A1 | Method of making an emitter with variable density photoresist layer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-05-01 | — | — | US | disclosed |
| US-20020167001-A1 | ANNEALED TUNNELING EMITTER | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-11-14 | — | — | US | disclosed |
| WO-2002089167-A2 | TUNNELING EMITTER | HEWLETT-PACKARD COMPANY (US) | 2002-11-07 | — | — | WO | disclosed |