SCHEMBL5619293

SCHEMBL5619293

CON(OC)C(C)(OC)OC

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1890 0.67
SCHEMBL15698604 0.62
SCHEMBL9051409 0.60 TSHR (0.38) ALDH1A1
SCHEMBL3146727 0.60 ALDH1A1 (0.38) ALDH1A1
SCHEMBL503396 0.57
SCHEMBL8679785 0.57 ALDH1A1 (1.00) ALDH1A1
SCHEMBL6223 0.57
SCHEMBL5430943 0.56
SCHEMBL12562398 0.54 ALDH1A1 (0.33) ALDH1A1
SCHEMBL3662439 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1117003-B1 Process of preparing a chemical amplification type resist composition SHINETSU CHEMICAL CO (JP) 2012-06-20 EP disclosed
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-20050014092-A1 Novel compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-20 US disclosed