SCHEMBL5620183

SCHEMBL5620183

CC1=C(C)C(C)C([Ti](Oc2cc(C)cc([Si](C)(C)C(C)(C)C)c2)=C(c2ccccc2)c2ccccc2)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL820103 0.99
Hydrochloric Acid SCHEMBL819334 0.88
Hydrochloric Acid SCHEMBL714698 0.84 MDM2 (0.30)
Hydrochloric Acid SCHEMBL819959 0.84
Hydrochloric Acid SCHEMBL715438 0.82 RXRA (0.32)
Hydrochloric Acid SCHEMBL3672531 0.81
SCHEMBL5612989 0.78
Hydrochloric Acid SCHEMBL819053 0.77
SCHEMBL7170562 0.76 NR1H2 (0.31)
SCHEMBL5553340 0.76 NR4A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2007023618-A1 HOMOPOLYMER AND COPOLYMER, AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-03-01 WO disclosed