SCHEMBL5636385

SCHEMBL5636385

FC(F)(F)C(F)(F)C(F)(F)CO[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20377998 0.92
SCHEMBL28585604 0.89 LMNA (0.33)
SCHEMBL15644868 0.89 LMNA (0.33)
SCHEMBL1758677 0.75
SCHEMBL14598229 0.71
SCHEMBL7156173 0.71 LMNA (0.30)
SCHEMBL7148647 0.71
SCHEMBL21899301 0.71
SCHEMBL21633696 0.71
SCHEMBL9077033 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7125647-B2 Radiation-sensitive composition changing in refractive index and utilization thereof JSR CORPORATION (JP) 2006-10-24 US disclosed
US-7108954-B2 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2006-09-19 US disclosed
US-7071255-B2 Radiation-sensitive composition capable of having refractive index distribution JSR CORPORATION (JP) 2006-07-04 US disclosed
US-20040013972-A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2004-01-22 US disclosed
EP-1375597-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF JSR Corporation (JP) 2004-01-02 EP disclosed
EP-1369459-A1 RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION JSR Corporation (JP) 2003-12-10 EP disclosed
EP-1350814-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX JSR Corporation (JP) 2003-10-08 EP disclosed
US-20030187119-A1 Radiation-sensitive composition capable of having refractive index distribution JSR CORPORATION (JP) 2003-10-02 US disclosed
US-20030171468-A1 Radiation-sensitive composition changing in refractive index and utilization thereof JSR CORPORATION (JP) 2003-09-11 US disclosed