⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4655169 | 0.88 | TSHR (0.33) | — | |
| SCHEMBL3335346 | 0.84 | TSHR (0.36) | — | |
| SCHEMBL4450507 | 0.82 | TSHR (0.37) | — | |
| SCHEMBL16428382 | 0.81 | TSHR (0.42) | — | |
| SCHEMBL306017 | 0.81 | TSHR (0.42) | — | |
| SCHEMBL3335779 | 0.80 | TSHR (0.41) | — | |
| SCHEMBL27592030 | 0.80 | TSHR (0.41) | — | |
| SCHEMBL6884225 | 0.80 | TSHR (0.41) | — | |
| SCHEMBL306582 | 0.80 | — | — | |
| SCHEMBL28180886 | 0.79 | LMNA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 148 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2008084046-A1 | PLASTICIZERS FOR POLYVINYL ACETALS AND POLYSULFIDES | BASF SE (DE) | 2008-07-17 | — | — | WO | claimed |
| EP-3385791-B1 | PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, LAMINATE FILM, AND UPPER LAYER FILM FORMATION COMPOSITION | FUJIFILM CORP (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11249395-B2 | Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film | FUJIFILM CORPORATION (JP) | 2022-02-15 | — | — | US | disclosed |
| CN-108292097-B | Pattern forming method, method for manufacturing electronic device, laminated film, and composition for forming upper layer film | 富士胶片株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-106796401-B | Pattern forming method, composition for forming upper layer film, resist pattern, and method for manufacturing electronic device | 富士胶片株式会社 | 2021-06-29 | — | — | CN | disclosed |
| CN-107407887-B | Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device | 富士胶片株式会社 | 2021-06-08 | — | — | CN | disclosed |
| US-10761426-B2 | Pattern forming method, method for manufacturing electronic device, and laminate | FUJIFILM CORPORATION (JP) | 2020-09-01 | — | — | US | disclosed |
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10663864-B2 | Pattern forming method, method for manufacturing electronic device, and laminate | FUJIFILM CORPORATION (JP) | 2020-05-26 | — | — | US | disclosed |
| CN-106605174-B | Negative pattern forming method, composition for forming protective film, and method for manufacturing electronic device | 富士胶片株式会社 | 2020-05-19 | — | — | CN | disclosed |
| US-20070148595-A1 | Resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid, a photoacid generator, methacrylic resins having hydrolysable ester groups and solvent; profiles; pattern collapse; immersion exposure; ARF lasers | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |
| WO-2007069079-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND DIOLS FROM 2,3-DISUBSTITUTED AND 2,3-TRISUBSTITUTED EPOXIDES | CSIR (US) | 2007-06-21 | — | — | WO | disclosed |
| EP-1756271-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM 2,2-DISUBSTITUTED EPOXIDES | CSIR (ZA) | 2007-02-28 | — | — | EP | disclosed |
| EP-1753862-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM MESO-EPOXIDES | CSIR (ZA) | 2007-02-21 | — | — | EP | disclosed |
| WO-2006109198-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE GLYCIDYL ETHERS AND OPTICALLY ACTIVE VICINAL DIOLS FROM RACEMIC SUBSTRATES | OXYRANE UK LIMITED (GB) | 2006-10-19 | — | — | WO | disclosed |
| WO-2005100587-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM 2,2-DISUBSTITUTED EPOXIDES | CSIR (ZA) | 2005-10-27 | — | — | WO | disclosed |
| WO-2005100578-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM MESO-EPOXIDES | CSIR (ZA) | 2005-10-27 | — | — | WO | disclosed |
| CN-1203089-C | New compound | FUJISAWA PHARMACEUTICAL CO (JP) | 2005-05-25 | — | — | CN | disclosed |
| CN-1537059-A | Thermal imaging system | — | 2004-10-13 | — | — | CN | disclosed |
| CN-1168675-A | Novel compounds | FUJISAWA PHARMACEUTICAL CO (JP) | 1997-12-24 | — | — | CN | disclosed |