⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL33041 | 0.95 | — | — | |
| Fluoride SCHEMBL1501667 | 0.90 | — | — | |
| SCHEMBL27660015 | 0.90 | — | — | |
| Fluoride SCHEMBL25175826 | 0.90 | — | — | |
| SCHEMBL11096784 | 0.90 | — | — | |
| SCHEMBL15936382 | 0.86 | — | — | |
| Benzene SCHEMBL8002830 | 0.82 | ALDH1A1 (0.30) | — | |
| SCHEMBL6752140 | 0.79 | — | — | |
| SCHEMBL1501604 | 0.79 | — | — | |
| Methoxymethane SCHEMBL28799280 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9564638-B2 | Battery electrode or separator surface protective agent composition, battery electrode or separator protected by the composition, and battery having the battery electrode or separator | KYORITSU CHEMICAL & CO., LTD. (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20130260207-A1 | BATTERY ELECTRODE OR SEPARATOR SURFACE PROTECTIVE AGENT COMPOSITION, BATTERY ELECTRODE OR SEPARATOR PROTECTED BY THE COMPOSITION, AND BATTERY HAVING THE BATTERY ELECTRODE OR SEPARATOR | KYORITSU CHEMICAL & CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-7108954-B2 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |