Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 5/20 | 0.59 |
| ▸ | TET3 | O43151 | 1/20 | 0.39 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.39 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.33 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.33 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.33 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3143412 | 0.91 | TET2 (0.55) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL613504 | 0.80 | TET2 (0.46) | TET2TET3TET1 | |
| SCHEMBL562519 | 0.80 | TET2 (0.59) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL562800 | 0.80 | TET2 (0.59) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL166215 | 0.79 | TET2 (0.58) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL14556955 | 0.78 | TET2 (0.63) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL532501 | 0.76 | TET2 (0.55) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL562995 | 0.76 | TET2 (0.55) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL563522 | 0.75 | TET2 (0.53) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL8144771 | 0.73 | TET2 (0.52) | TET2TET3TET1GRIK1GRIK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2404940-B1 | Method for producing polymer composition and polymer composition | INCTEC INC (JP) | 2014-12-24 | — | — | EP | claimed |
| US-20170160637-A9 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-9529259-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9465291-B2 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-20160109801-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-9268219-B2 | Photoresist composition and resist pattern-forming method | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-2743319-B1 | Pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet | NITTO DENKO CORP (JP) | 2015-07-22 | — | — | EP | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100255420-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100215947-A1 | HEAT-EXPANDABLE REMOVABLE ACRYLIC PRESSURE-SENSITIVE ADHESIVE TAPE OR SHEET | NITTO DENKO CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |
| US-7723445-B2 | Curable resin composition, molded product, and process for producing the same | SHOWA HIGHPOLYMER CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-20100075129-A1 | THERMALLY-FOAMABLE RE-RELEASABLE ACRYLIC PRESSURE-SENSITIVE ADHESIVE TAPE OR SHEET | NITTO DENKO CORPORATION (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |
| EP-1785440-A1 | CURABLE RESIN COMPOSITION, SHAPED ARTICLE AND METHOD FOR PRODUCING SAME | Showa Highpolymer Co., Ltd. (JP) | 2007-05-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | RER1, MSR1, MRPS35 | TET2 4300/4885TET3 3885/4885TET1 3326/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.