⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15870582 | 1.00 | — | — | |
| SCHEMBL12226908 | 1.00 | APLNR (0.43) | — | |
| SCHEMBL10149726 | 1.00 | — | — | |
| SCHEMBL11880932 | 0.89 | APLNR (0.39) | — | |
| SCHEMBL10268948 | 0.84 | KDM4E (0.46) | — | |
| SCHEMBL11501519 | 0.84 | KDM4E (0.46) | — | |
| SCHEMBL15062108 | 0.84 | — | — | |
| SCHEMBL21727237 | 0.84 | KDM4E (0.46) | — | |
| SCHEMBL9197226 | 0.84 | — | — | |
| SCHEMBL5481927 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 257 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027906-A1 | COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT AND COLOR FILTER | SAMSUNG SDI CO., LTD. (KR) | 2024-01-25 | — | — | US | claimed |
| US-11762289-B2 | Composition including quantum dot, manufacturing method quantum dot and color filter | SAMSUNG SDI CO., LTD. (KR) | 2023-09-19 | — | — | US | claimed |
| US-10876046-B2 | Curable composition including quantum dot, resin layer using the same and display device | SAMSUNG SDI CO., LTD. (KR) | 2020-12-29 | — | — | US | claimed |
| US-20200339876-A1 | CURABLE COMPOSITION INCLUDING QUANTUM DOT, RESIN LAYER USING THE SAME AND DISPLAY DEVICE INCLUDING THE RESIN LAYER | SAMSUNG SDI CO., LTD. (KR) | 2020-10-29 | — | — | US | claimed |
| US-20190129302-A1 | COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT AND COLOR FILTER | SAMSUNG SDI CO., LTD. (KR) | 2019-05-02 | — | — | US | claimed |
| US-20180284557-A1 | ELECTROCHEMICAL MIRROR | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-10-04 | — | — | US | claimed |
| EP-1300487-B1 | Copper plating bath | ROHM & HAAS ELECT MAT (US) | 2017-10-04 | — | — | EP | claimed |
| US-9493886-B2 | Low internal stress copper electroplating method | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2016-11-15 | — | — | US | claimed |
| US-20130240368-A1 | LOW INTERNAL STRESS COPPER ELECTROPLATING METHOD | ROHM AND HAAS ELECTRONIC MATERIAL LLC (US) | 2013-09-19 | — | — | US | claimed |
| EP-2568063-A1 | Low internal stress copper electroplating method | Rohm and Haas Electronic Materials LLC (US) | 2013-03-13 | — | — | EP | claimed |
| US-20030085132-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2003-05-08 | — | — | US | claimed |
| EP-1308540-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-05-07 | — | — | EP | claimed |
| EP-1308541-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Company LLC (US) | 2003-05-07 | — | — | EP | claimed |
| US-20030070934-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2003-04-17 | — | — | US | claimed |
| US-20030066756-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2003-04-10 | — | — | US | claimed |
| EP-1300486-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | claimed |
| EP-1300488-A2 | Plating path and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | claimed |
| EP-1300487-A1 | Plating bath and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | claimed |
| EP-0815178-A1 | CLEANING AND/OR STRIPPING ETHER OR DIACID ESTER BASED COMPOSITION | RHONE-POULENC CHIMIE (FR) | 1998-01-07 | — | — | EP | claimed |
| WO-1996030453-A1 | CLEANING AND/OR STRIPPING ETHER OR DIACID ESTER BASED COMPOSITION | RHONE-POULENC CHIMIE (FR) | 1996-10-03 | — | — | WO | claimed |