SCHEMBL564437

SCHEMBL564437

C=C[Si](C)(C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16361377 0.83
SCHEMBL26011799 0.78
SCHEMBL565313 0.77
SCHEMBL12158556 0.76
SCHEMBL1493074 0.74
SCHEMBL5701397 0.74
SCHEMBL4274903 0.73
SCHEMBL1066376 0.73
SCHEMBL81570 0.73
SCHEMBL8719740 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110021460-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS, INC. 2011-01-27 US claimed
US-7834118-B2 Selective hydrosilylation method with rhodium catalyst MOMENTIVE PERFORMANCE MATERIALS INC (US) 2010-11-16 US claimed
US-20080081924-A1 SELECTIVE MOLAR EXCESS HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-04-03 US claimed
US-20080076896-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-03-27 US claimed
US-20080076939-A1 Two-step process of reacting a dihydroorganosiloxane with a terminally unsaturated compound in the presence of a rhodium catalyst and then with a different unsaturated compound to form an assymetrically disubstitued siloxane; one of the unsaturated compounds is an alkenyl polyalkylene oxide MOMENTIVE PERFORMANCE MATERIALS INC. 2008-03-27 US claimed
US-7326761-B1 Selective hydrosilylation method and product GENERAL ELECTRIC COMPANY (US) 2008-02-05 US claimed
US-20080015325-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-01-17 US claimed
US-20080015324-A1 Use of tris(dibutylsulfide)rhodium trichloride catalyst to make a siloxane-functional polyoxyalkylene glycol; use as a hydrolysis resistant-imparting agent for a composition in need of hydrolysis resistance such as agrochemical, personal care, and home care formulations MOMENTIVE PERFORMANCE MATERIALS INC. 2008-01-17 US claimed
US-20080015323-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-01-17 US claimed
US-7259220-B1 Selective hydrosilylation method GENERAL ELECTRIC COMPANY (US) 2007-08-21 US claimed
US-11860535-B2 Imprint lithography stamp method of making and using the same KONINKLIJKE PHILIPS N.V. (NL) 2024-01-02 US disclosed
US-8217129-B2 Polyalkylene oxide asymmetric siloxane MOMENTIVE PERFORMANCE MATERIALS (US) 2012-07-10 US disclosed
US-20120035385-A1 SELECTING CATALYST AND CONDITIONS RINARD CHAUNCEY J (US) 2012-02-09 US disclosed
US-20110172453-A1 ASYMMETRIC SILOXANE MOMENTIVE PERFORMANCE MATERIALS INC. 2011-07-14 US disclosed
US-7968666-B2 Use of rhodium catalyst to make a siloxane-functional polyoxyalkylene glycol; use as a hydrolysis resistant-imparting agent for agrochemical, personal care, and home care formulations; tetramethyldisiloxane and vinyltrimethylsilane reaction product further reacted with allyloxy-methoxypolyethylene glycol MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2011-06-28 US disclosed
US-20080015325-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-01-17 US disclosed
US-20080015323-A1 SELECTIVE HYDROSILYLATION METHOD AND PRODUCT MOMENTIVE PERFORMANCE MATERIALS INC. 2008-01-17 US disclosed
US-7259220-B1 Selective hydrosilylation method GENERAL ELECTRIC COMPANY (US) 2007-08-21 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed