⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1502326 | 0.84 | — | — | |
| SCHEMBL564437 | 0.77 | — | — | |
| SCHEMBL8153732 | 0.76 | — | — | |
| SCHEMBL1066376 | 0.73 | — | — | |
| SCHEMBL4274903 | 0.73 | — | — | |
| SCHEMBL81570 | 0.73 | — | — | |
| SCHEMBL1905434 | 0.72 | — | — | |
| SCHEMBL1404386 | 0.72 | TSHR (0.35) | — | |
| SCHEMBL17918176 | 0.72 | — | — | |
| Water SCHEMBL29019951 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20110021460-A1 | SELECTIVE HYDROSILYLATION METHOD AND PRODUCT | MOMENTIVE PERFORMANCE MATERIALS, INC. | 2011-01-27 | — | — | US | claimed |
| US-7834118-B2 | Selective hydrosilylation method with rhodium catalyst | MOMENTIVE PERFORMANCE MATERIALS INC (US) | 2010-11-16 | — | — | US | claimed |
| US-20080081924-A1 | SELECTIVE MOLAR EXCESS HYDROSILYLATION METHOD AND PRODUCT | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-03 | — | — | US | claimed |
| US-20080076896-A1 | SELECTIVE HYDROSILYLATION METHOD AND PRODUCT | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-03-27 | — | — | US | claimed |
| US-20080076939-A1 | Two-step process of reacting a dihydroorganosiloxane with a terminally unsaturated compound in the presence of a rhodium catalyst and then with a different unsaturated compound to form an assymetrically disubstitued siloxane; one of the unsaturated compounds is an alkenyl polyalkylene oxide | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-03-27 | — | — | US | claimed |
| US-7326761-B1 | Selective hydrosilylation method and product | GENERAL ELECTRIC COMPANY (US) | 2008-02-05 | — | — | US | claimed |
| US-20080015325-A1 | SELECTIVE HYDROSILYLATION METHOD AND PRODUCT | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-01-17 | — | — | US | claimed |
| US-20080015323-A1 | SELECTIVE HYDROSILYLATION METHOD AND PRODUCT | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-01-17 | — | — | US | claimed |
| US-20080015324-A1 | Use of tris(dibutylsulfide)rhodium trichloride catalyst to make a siloxane-functional polyoxyalkylene glycol; use as a hydrolysis resistant-imparting agent for a composition in need of hydrolysis resistance such as agrochemical, personal care, and home care formulations | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-01-17 | — | — | US | claimed |
| US-7259220-B1 | Selective hydrosilylation method | GENERAL ELECTRIC COMPANY (US) | 2007-08-21 | — | — | US | claimed |
| US-20060257673-A1 | Laminates, their production and use | CELANESE EMULSIONS GMBH (DE) | 2006-11-16 | — | — | US | claimed |
| EP-1721731-A1 | Layered structure, method of its preparation and use | Celanese Emulsions GmbH (DE) | 2006-11-15 | — | — | EP | claimed |
| US-6114423-A | Redispersable cross-linkable dispersion powders | WACKER-CHEMIE GMBH (DE) | 2000-09-05 | — | — | US | claimed |
| EP-0840754-B1 | REDISPERSABLE CROSS-LINKABLE DISPERSION POWDERS | WACKER CHEMIE GMBH (DE) | 1999-06-02 | — | — | EP | claimed |