Diphenylsulfane

Diphenylsulfane

SCHEMBL5650013

CS(=O)(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)cc1.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.47

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
JAK2 O60674 1/20 0.47
JAK3 P52333 1/20 0.47
PTK2 Q05397 1/20 0.47
PIK3CD O00329 1/20 0.40
PIK3CA P42336 1/20 0.40
PIK3CB P42338 1/20 0.40
CA1 P00915 6/20 0.38
CA2 P00918 6/20 0.38
PTGS2 P35354 9/20 0.38
PTGS1 P23219 1/20 0.38
KIF11 P52732 1/20 0.36
STS P08842 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylsulfane SCHEMBL1772327 0.91 PIK3CD (0.45) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL6501320 0.89 STS (0.45) JAK2JAK3PTK2PIK3CDPIK3CA
SCHEMBL2572784 0.89 STS (0.45) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL18863901 0.87 PIK3CD (0.41) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL4999052 0.87 PIK3CD (0.41) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL5648428 0.86 PIK3CD (0.41) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL4990263 0.85 PIK3CD (0.42) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL2896196 0.85 PIK3CD (0.40) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL2897548 0.85 CA1 (0.43) JAK2JAK3PTK2PIK3CDPIK3CA
Diphenylsulfane SCHEMBL2902245 0.84 PIK3CD (0.41) JAK2JAK3PTK2PIK3CDPIK3CA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed