Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8632640 | 0.75 | — | — | |
| SCHEMBL14840767 | 0.75 | — | — | |
| SCHEMBL5080861 | 0.71 | — | — | |
| SCHEMBL2057395 | 0.69 | — | — | |
| SCHEMBL2057540 | 0.68 | — | — | |
| SCHEMBL3207645 | 0.67 | TSHR (0.43) | TSHRTDP1ALDH1A1 | |
| SCHEMBL461524 | 0.62 | — | — | |
| SCHEMBL20970124 | 0.62 | — | — | |
| SCHEMBL10777347 | 0.62 | — | — | |
| SCHEMBL17024465 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-9484248-B2 | Patternable dielectric film structure with improved lithography and method of fabricating same | GLOBALFOUNDRIES INC. (KY) | 2016-11-01 | — | — | US | disclosed |
| US-9431295-B2 | Interconnect structure including a modified photoresist as a permanent interconnect dielectric and method of fabricating same | GLOBALFOUNDRIES INC. (KY) | 2016-08-30 | — | — | US | disclosed |
| US-9035462-B2 | Airgap-containing interconnect structure with patternable low-k material and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-05-19 | — | — | US | disclosed |
| US-8916978-B2 | Interconnect structure and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-23 | — | — | US | disclosed |
| US-8853856-B2 | Methodology for evaluation of electrical characteristics of carbon nanotubes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-10-07 | — | — | US | disclosed |
| US-8828749-B2 | Methodology for evaluation of electrical characteristics of carbon nanotubes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-09 | — | — | US | disclosed |
| US-8795556-B2 | Self-aligned permanent on-chip interconnect structure formed by pitch splitting | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-08-05 | — | — | US | disclosed |
| US-8659115-B2 | Airgap-containing interconnect structure with improved patternable low-K material and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-25 | — | — | US | disclosed |
| US-20080150091-A1 | MULTIPLE PATTERNING USING PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-06-26 | — | — | US | disclosed |
| US-6586156-B2 | A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-07-01 | — | — | US | disclosed |
| US-20030049561-A1 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-03-13 | — | — | US | disclosed |
| US-6303263-B1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | INTERNATIONAL BUSINESS MACHINES MACHINES | 2001-10-16 | — | — | US | disclosed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | disclosed |
| EP-0939340-A1 | Radiation sensitive resists | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |
| EP-0939339-A1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |