SCHEMBL461524

SCHEMBL461524

CC(C)(C)[SiH2]O[SiH2]C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704367 0.70
SCHEMBL702303 0.67 TSHR (0.31)
SCHEMBL782684 0.65
SCHEMBL9813039 0.62 TSHR (0.44)
SCHEMBL706504 0.62
SCHEMBL8632646 0.62
SCHEMBL211973 0.62 TSHR (0.31)
SCHEMBL565254 0.62 TSHR (0.35)
SCHEMBL19927497 0.62
SCHEMBL10760167 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
CN-111187797-B Method for synthesizing nucleic acid having predetermined sequence 深圳华大生命科学研究院 2024-01-05 CN claimed
CN-111565859-B Surface treatment composition and method 富士胶片电子材料美国有限公司 2022-12-30 CN claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
CN-112513192-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2021-03-16 CN claimed
CN-111565859-A Surface treatment composition and method 富士胶片电子材料美国有限公司 2020-08-21 CN claimed
US-20200035494-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-01-30 US claimed
US-20190211210-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2019-07-11 US claimed
US-6210856-B1 Resist composition and process of forming a patterned resist layer on a substrate INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-04-03 US claimed
US-6103447-A Approach to formulating irradiation sensitive positive resists INTERNATIONAL BUSINESS MACHINES CORP. (US) 2000-08-15 US claimed
EP-0688341-B1 BUTADIENE POLYMERS HAVING TERMINAL SILYL GROUPS SHELL INT RESEARCH (NL) 1997-06-11 EP claimed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
US-4585791-A ANTIULCER, LUTEOLYTIC FARMITALIA CARLO ERBA, S.P.A. (IT) 1986-04-29 US disclosed
EP-0024292-B1 PROCESS FOR THE SEPARATION OF URSODEOXYCHOLIC ACID FROM CHENODEOXYCHOLIC ACID AND PRODUCTS OBTAINED DURING THE PROCESS BLASCHIM S.p.A. (IT) 1983-06-01 EP disclosed
US-4307112-A 9-Deoxy-9A-methylene isosteres of PGI2 and process for their preparation FARMITALIA CARLO ERBA S.P.A. (IT) 1981-12-22 US disclosed