Bromide

Bromide

SCHEMBL565418

CCCCCCCCCCCC[n+]1cccc2ccccc21.[Br-]

nearest known ligand 0.93

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ACHE known ✓ P22303 13/20 0.83
KDM4E B2RXH2 1/20 0.93
MEN1 O00255 1/20 0.93
RGS12 O14924 1/20 0.93
NPC1 O15118 1/20 0.93
USP2 O75604 1/20 0.93
LMNA P02545 1/20 0.93
HSP90AA1 P07900 1/20 0.93
THRB P10828 1/20 0.93
MAPK1 P28482 1/20 0.93
HTT P42858 1/20 0.93
RAD52 P43351 1/20 0.93
RAB9A P51151 1/20 0.93
KMT2A Q03164 1/20 0.93
MCL1 Q07820 1/20 0.93
SMN1; SMN2 Q16637 1/20 0.93
NPSR1 Q6W5P4 1/20 0.93
BCHE P06276 13/20 0.83

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL3359102 1.00 KDM4E (0.93) KDM4EMEN1RGS12NPC1USP2
Bromide SCHEMBL3359440 1.00 KDM4E (0.93) KDM4EMEN1RGS12NPC1USP2
Bromide SCHEMBL3360044 1.00 KDM4E (0.93) KDM4EMEN1RGS12NPC1USP2
Bromide SCHEMBL3359702 1.00 KDM4E (0.93) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1412685 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL9319117 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL29721510 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL4061564 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1963218 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1412766 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11066749-B2 Corrosion inhibition of HCL treatment fluids with environmentally compatible solvent HALLIBURTON ENERGY SERVICES, INC. (US) 2021-07-20 US claimed
US-20200173034-A1 Corrosion Inhibition of HCL Treatment Fluids with Environmentally Compatible Solvent HALLIBURTON ENERGY SERVICES, INC. (US) 2020-06-04 US claimed
US-10604850-B2 Corrosion inhibition of HCL treatment fluids with environmentally compatible solvent HALLIBURTON ENERGY SERVICES, INC. (US) 2020-03-31 US claimed
US-20180127882-A1 Corrosion Inhibition of HCL Treatment Fluids with Environmentally Compatible Solvent HALLIBURTON ENERGY SERVICES, INC. (US) 2018-05-10 US claimed
WO-2016190865-A1 CORROSION INHIBITION OF HCL TREATMENT FLUIDS WITH ENVIRONMENTALLY COMPATIBLE SOLVENT HALLIBURTON ENERGY SERVICES, INC. (US) 2016-12-01 WO claimed
US-8367358-B2 Reagent, kit and method for differentiating and counting leukocytes SHENZHEN MINDRAY BIO-MEDICAL ELECTRONICS CO., LTD. (CN) 2013-02-05 US claimed
US-20100151509-A1 REAGENT, KIT AND METHOD FOR DIFFERENTATING AND COUNTING LEUKOCYTES SHENZHEN MINDRAY BIO-MEDICAL ELECTRONICS CO., LTD. (CN) 2010-06-17 US claimed
US-12515973-B1 Scale treatment in geothermal or extremely high temperature wells HALLIBURTON ENERGY SERVICES, INC. (US) 2026-01-06 US disclosed
US-20240170278-A1 METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENTS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-05-23 US disclosed
US-20240117277-A1 COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-11 US disclosed
EP-4293097-A1 COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-20 EP disclosed
WO-2022202646-A1 METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENTS 三菱瓦斯化学株式会社 2022-09-29 WO disclosed
WO-2022172862-A1 COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE 三菱瓦斯化学株式会社 2022-08-18 WO disclosed
US-4680256-A Emulsions and photographic elements containing silver halide grains having trisoctahedra crystal faces EASTMAN KODAK COMPANY (US) 1987-07-14 US disclosed
EP-0215612-A2 Silver halide photographic emulsions with novel grain faces (5) EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-03-25 EP disclosed
EP-0213964-A2 Silver halide photographic emulsions with novel grain faces (3) EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-03-11 EP disclosed
US-4643966-A SPECTRAL SENSITIZING DYES AS GROWTH MODIFIERS; ANTIFOGGING AGENTS, STABILIZERS; TETRAAZAINDENES, CARBOCYANINES EASTMAN KODAK COMPANY (US) 1987-02-17 US disclosed
US-4183913-A CARBODIIMIDE AND HETEROCYCLIC QUATERNARY AMMONIUM COMPOUND BAYER AKTIENGESELLSCHAFT (DE) 1980-01-15 US disclosed
US-4112065-A Compositions of bis(ortho-substituted phenyl)carbodiimides and quaternary ammonium salts and their use thereof in combatting ectoparasitic tick infestations of animals BAYER AKTIENGESELLSCHAFT (GE) 1978-09-05 US disclosed
US-3966631-A Nematic liquid crystal composition HITACHI, LTD. (JA) 1976-06-29 US disclosed