Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 3/20 | 0.41 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.36 |
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.36 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 4/20 | 0.34 |
| ▸ | CA2 | P00918 | 4/20 | 0.34 |
| ▸ | CA9 | Q16790 | 4/20 | 0.34 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.34 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.34 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10427243 | 0.88 | DNM1 (0.44) | DNM1LPAR1LPAR3 | |
| SCHEMBL5613132 | 0.81 | CA1 (0.31) | CA1CA2 | |
| SCHEMBL7529088 | 0.80 | DNM1 (0.44) | DNM1LPAR1LPAR3PLA2G2CLPAR2 | |
| SCHEMBL7526349 | 0.78 | DNM1 (0.41) | DNM1LPAR1LPAR3PLA2G2CCA1 | |
| SCHEMBL2670445 | 0.77 | DNM1 (0.48) | DNM1LPAR1LPAR3PLA2G2CCA1 | |
| SCHEMBL28071184 | 0.77 | HTT (0.42) | DNM1LPAR1LPAR3PLA2G2CLPAR2 | |
| SCHEMBL23149779 | 0.74 | DNM1 (0.50) | DNM1LPAR1LPAR3CA1CA2 | |
| SCHEMBL11180663 | 0.74 | DNM1 (0.50) | DNM1LPAR1LPAR3CA1CA2 | |
| SCHEMBL7858965 | 0.74 | DNM1 (0.50) | DNM1LPAR1LPAR3CA1CA2 | |
| SCHEMBL8586883 | 0.74 | DNM1 (0.50) | DNM1LPAR1LPAR3CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| EP-1469822-A2 | COSMETIC OR DERMATOLOGICAL PREPARATIONS FOR PREVENTING DAMAGES TO SKIN CAUSED BY PEROXIDES | BASF AKTIENGESELLSCHAFT (DE) | 2004-10-27 | — | — | EP | disclosed |
| WO-2003084484-A2 | COMPOSITION PROVIDING UV PROTECTION | BASF AKTIENGESELLSCHAFT (DE) | 2003-10-16 | — | — | WO | disclosed |
| WO-2003059312-A2 | COSMETIC OR DERMATOLOGICAL PREPARATIONS FOR PREVENTING DAMAGES TO SKIN CAUSED BY PEROXIDES | BASF AKTIENGESELLSCHAFT (DE) | 2003-07-24 | — | — | WO | disclosed |
| EP-0945125-A1 | Cosmetic and pharmaceutical compositions containing photostable uv filters | BASF AKTIENGESELLSCHAFT (DE) | 1999-09-29 | — | — | EP | disclosed |
| EP-0140033-B1 | SEBOSUPPRESIVE COSMETIC COMPOSITION CONTAINING ALKOXYARYL ALKANOLS | Henkel Kommanditgesellschaft auf Aktien (DE) | 1990-01-31 | — | — | EP | disclosed |
| EP-0140033-A2 | Sebosuppresive cosmetic composition containing alkoxyaryl alkanols | Henkel Kommanditgesellschaft auf Aktien (DE) | 1985-05-08 | — | — | EP | disclosed |