⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31388684 | 0.79 | — | — | |
| SCHEMBL8437908 | 0.78 | — | — | |
| SCHEMBL19183339 | 0.77 | — | — | |
| SCHEMBL9876093 | 0.77 | — | — | |
| SCHEMBL10726749 | 0.74 | — | — | |
| SCHEMBL11026748 | 0.72 | HSD11B1 (0.31) | — | |
| SCHEMBL10721940 | 0.70 | — | — | |
| SCHEMBL39164 | 0.69 | POLB (0.30) | — | |
| SCHEMBL10721864 | 0.68 | HSD11B1 (0.36) | — | |
| SCHEMBL21603133 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1300488-B1 | Plating path and method for depositing a metal layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-09-27 | — | — | EP | claimed |
| US-20050139118-A1 | Brightener degradation inhibitor compound in copper plating bath | SHIPLEY COMPANY, L.L.C. (US) | 2005-06-30 | — | — | US | claimed |
| US-6911068-B2 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. (US) | 2005-06-28 | — | — | US | claimed |
| US-20040206631-A1 | Plating bath and method for depositing a metal layer on a substrate | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | claimed |
| EP-1300488-A2 | Plating path and method for depositing a metal layer on a substrate | Shipley Co. L.L.C. (US) | 2003-04-09 | — | — | EP | claimed |
| WO-2025202488-A1 | ENHANCER OF NUCLEIC ACID AMPLIFICATION | ROCHE DIAGNOSTICS GMBH (DE) | 2025-10-02 | — | — | WO | disclosed |
| EP-1300488-B1 | Plating path and method for depositing a metal layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-09-27 | — | — | EP | disclosed |
| US-8956523-B2 | Metal plating compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-02-17 | — | — | US | disclosed |
| US-20140081045-A1 | METAL PLATING COMPOSITIONS AND METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-03-20 | — | — | US | disclosed |
| EP-2468717-B1 | Heterocyclic Amide Compounds Useful as Kinase Inhibitors | BRISTOL MYERS SQUIBB CO (US) | 2013-11-20 | — | — | EP | disclosed |
| EP-1978134-B1 | Metal plating compositions | ROHM & HAAS ELECT MAT (US) | 2013-09-11 | — | — | EP | disclosed |
| US-8481519-B2 | Isolation of atraric acid, synthesis of atraric acid derivatives, and use of atraric acid and the derivatives thereof for the treatment of benign prostatic hyperplasia, prostate carcinoma and spinobulbar muscular atrophy | LTS LOHMANN THERAPIE-SYSTEME AG (DE) | 2013-07-09 | — | — | US | disclosed |
| WO-2001055411-A2 | HUMAN SULFATASES | MILLENNIUM PHARMACEUTICALS, INC. (US) | 2001-08-02 | — | — | WO | disclosed |
| EP-0861864-A2 | Method of preparation of polyquinolines | HITACHI CHEMICAL CO., LTD. (JP) | 1998-09-02 | — | — | EP | disclosed |
| US-5786071-A | Method of preparation of polyquinolines | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1998-07-28 | — | — | US | disclosed |
| US-5648448-A | Method of preparation of polyquinolines | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-07-15 | — | — | US | disclosed |
| EP-0384350-B1 | DIHYDROXY NAPHTHALENE DERIVATIVES | F. HOFFMANN-LA ROCHE AG (CH) | 1993-04-28 | — | — | EP | disclosed |
| US-5064914-A | By transesterification; high melt strength; extrusion, blow molding | GENERAL ELECTRIC COMPANY (US) | 1991-11-12 | — | — | US | disclosed |
| EP-0384350-A1 | Dihydroxy naphthalene derivatives | F. HOFFMANN-LA ROCHE AG (CH) | 1990-08-29 | — | — | EP | disclosed |
| EP-0351849-A2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-01-24 | — | — | EP | disclosed |