⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isobutyraldehyde SCHEMBL10413481 | 0.95 | — | — | |
| Isobutyraldehyde SCHEMBL2996 | 0.95 | — | — | |
| Isobutyraldehyde SCHEMBL18287436 | 0.95 | — | — | |
| Isobutyraldehyde SCHEMBL788159 | 0.95 | ADH1B (0.38) | — | |
| Isobutyraldehyde SCHEMBL2635854 | 0.95 | ADH1B (0.38) | — | |
| Isobutyraldehyde SCHEMBL9351587 | 0.90 | — | — | |
| Isobutyraldehyde SCHEMBL3458543 | 0.90 | — | — | |
| Isobutyraldehyde SCHEMBL20816986 | 0.90 | — | — | |
| Isobutyraldehyde SCHEMBL9404976 | 0.90 | — | — | |
| Isobutyraldehyde SCHEMBL4488958 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11394053-B2 | Composition for forming lithium reduction resistant layer, method for forming lithium reduction resistant layer, and lithium secondary battery | SEIKO EPSON CORPORATION (JP) | 2022-07-19 | — | — | US | disclosed |
| US-10947160-B2 | Solid electrolyte and lithium ion battery | SEIKO EPSON CORPORATION (JP) | 2021-03-16 | — | — | US | disclosed |
| US-20200369574-A1 | SOLID ELECTROLYTE AND LITHIUM ION BATTERY | SEIKO EPSON CORPORATION (JP) | 2020-11-26 | — | — | US | disclosed |
| US-10784534-B2 | Solid electrolyte and lithium ion battery | SEIKO EPSON CORPORATION (JP) | 2020-09-22 | — | — | US | disclosed |
| US-10774004-B2 | Solid electrolyte and lithium ion battery | SEIKO EPSON CORPORATION (JP) | 2020-09-15 | — | — | US | disclosed |
| US-20200144663-A1 | COMPOSITION FOR FORMING LITHIUM REDUCTION RESISTANT LAYER, METHOD FOR FORMING LITHIUM REDUCTION RESISTANT LAYER, AND LITHIUM SECONDARY BATTERY | SEIKO EPSON CORPORATION (JP) | 2020-05-07 | — | — | US | disclosed |
| US-20190097267-A1 | SOLID ELECTROLYTE AND LITHIUM ION BATTERY | SEIKO EPSON CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-20190084887-A1 | SOLID ELECTROLYTE AND LITHIUM ION BATTERY | SEIKO EPSON CORPORATION (JP) | 2019-03-21 | — | — | US | disclosed |
| US-20160093915-A1 | COMPOSITION FOR FORMING LITHIUM REDUCTION RESISTANT LAYER, METHOD FOR FORMING LITHIUM REDUCTION RESISTANT LAYER, AND LITHIUM SECONDARY BATTERY | SEIKO EPSON CORPORATION (JP) | 2016-03-31 | — | — | US | disclosed |
| US-20060156941-A1 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. | 2006-07-20 | — | — | US | disclosed |
| US-7032514-B2 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-6420091-B1 | HEAT MODE IRRADIATING PHOTOCATALYTIC, HYDROPHILIC METALLIC COMPOUND LAYER AND LIGHT-HEAT CONVERTIBLE PARTICLES; CONVERTING POLARITY TO FORM IMAGEWISE HYDROPHOBIC REGION; NO DEVELOPMENT REQUIRED; DURABILITY; REUSE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-16 | — | — | US | disclosed |
| EP-0903223-B1 | Lithographic printing method and printing plate precursor for lithographic printing | FUJI PHOTO FILM CO LTD (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-6391522-B1 | RADIATING WITH LIGHT/HEAT CONVERTIBLE RAYS TO IMAGEWISE DISTRIBUTE A HYDROPHILIC AND LIPOPHILIC ON ALKALINE EARTH METAL TITANATE, GROUP V MIXED OXIDE, TIN OXIDE, BISMUTH OXIDE, OR IRON OXIDE THIN FILM | FUJI PHOTO FILM CO., LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| US-20020001776-A1 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. | 2002-01-03 | — | — | US | disclosed |
| US-6048654-A | EXPOSURE OF PLATES WITH THIN FILMS OF TITANIUM OXIDE, ZINC OXIDE AND METAL TITANATES AND METAL OXIDE COMPOSITES | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |
| EP-0903223-A1 | Lithographic printing method and printing plate precursor for lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 1999-03-24 | — | — | EP | disclosed |