SCHEMBL5667276

SCHEMBL5667276

O=C(O)c1ccc(C(=O)O)c(-c2ccc(C#Cc3ccccc3)cc2)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HNF4A P41235 2/20 0.51
KDM4E B2RXH2 1/20 0.46
AKR1C2 P52895 1/20 0.44
AKR1C1 Q04828 1/20 0.44
TTR P02766 1/20 0.44
PTPRC P08575 2/20 0.42
RARB P10826 2/20 0.41
RARG P13631 2/20 0.41
RARA P10276 1/20 0.41
DDT P30046 1/20 0.41
POLB P06746 1/20 0.41
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 1/20 0.40
CDC25B P30305 2/20 0.40
CDC25A P30304 1/20 0.40
HSD17B10 Q99714 1/20 0.40
ATM Q13315 1/20 0.40
FOLH1 Q04609 1/20 0.40
SLC22A12 Q96S37 1/20 0.40
FFAR1 O14842 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5667919 0.88 DDT (0.49) HNF4AKDM4EAKR1C2AKR1C1TTR
SCHEMBL30777933 0.85 HNF4A (0.55) HNF4AKDM4ETTRPTPRCDDT
SCHEMBL27662171 0.85 HNF4A (0.55) HNF4AKDM4ETTRPTPRCDDT
SCHEMBL70541 0.85 KDM4E (0.56) HNF4AKDM4EAKR1C2AKR1C1TTR
SCHEMBL6225855 0.85 KDM4E (0.50) KDM4ETTRPTPRCDDTPOLB
Terephthalic Acid SCHEMBL28437947 0.83 KDM4E (0.55) HNF4AKDM4ETTRPTPRCDDT
Hydrochloric Acid SCHEMBL28890344 0.83 KDM4E (0.55) HNF4AKDM4EAKR1C2AKR1C1TTR
SCHEMBL27503029 0.83 FFAR1 (0.46) HNF4AKDM4ETTRPTPRCRARB
SCHEMBL599317 0.83 FOLH1 (0.53) KDM4ETTRPTPRCDDTHSD17B10
SCHEMBL2746127 0.83 KDM4C (0.41) KDM4ETTRPTPRCDDTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed