SCHEMBL5670331

SCHEMBL5670331

COC(C)(C)OOOC(=O)OC(=O)OOOC(C)(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1849318 0.91
SCHEMBL5670340 0.90
SCHEMBL542901 0.78 TSHR (0.35)
Ethylene SCHEMBL31265746 0.74 TSHR (0.32)
Ethylene SCHEMBL31265739 0.74 TSHR (0.32)
SCHEMBL1849320 0.74
SCHEMBL128837 0.74
SCHEMBL9177818 0.68 SOAT1 (0.38)
SCHEMBL542902 0.68 TSHR (0.35)
SCHEMBL42540 0.67 TSHR (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0658943-B1 SOLAR CELL MODULE HAVING EXCELLENT WEATHER RESISTANCE CANON KK (JP) 2006-08-30 EP disclosed
US-5718772-A FILLER IS MADE OF VINYLIDENE FLUORIDE COPOLYMER AND ACRYLIC RESIN; EXCELLENT HEAT/WEAR RESISTANCE; DESIRABLE PHOTOELECTRIC CONVERSION EFFICIENCY OVER A LONG PERIOD OF TIME CANON KABUSHIKI KAISHA (JP) 1998-02-17 US disclosed
US-5578141-A Solar cell module having excellent weather resistance CANON KABUSHIKI KAISHA (JP) 1996-11-26 US disclosed
EP-0658943-A1 SOLAR CELL MODULE HAVING EXCELLENT WEATHER RESISTANCE CANON KABUSHIKI KAISHA (JP) 1995-06-21 EP disclosed
US-5286796-A Adding to polymerization mixture water insoluble partially saponified polyvinyl acetate SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-02-15 US disclosed
US-5157091-A ULTRAVIOLET-ABSORBING POLYMER MATERIAL AND PHOTOETCHING PROCESS MASATAKA MURAHARA (JP) 1992-10-20 US disclosed
EP-0408763-A1 OPTICAL DISK AND METHOD OF MANUFACTURING THE SAME SEIKO EPSON CORPORATION (JP) 1991-01-23 EP disclosed
EP-0380667-A1 ULTRAVIOLET-ABSORBING POLYMER MATERIAL AND PHOTOETCHING PROCESS TERUMO KABUSHIKI KAISHA (JP) 1990-08-08 EP disclosed