⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL60364 | 1.00 | — | — | |
| SCHEMBL2094277 | 0.91 | — | — | |
| Bicarbonate SCHEMBL10322450 | 0.84 | CA2 (0.36) | — | |
| SCHEMBL1573229 | 0.82 | TSHR (0.35) | — | |
| SCHEMBL13717038 | 0.79 | — | — | |
| SCHEMBL1573366 | 0.79 | TSHR (0.50) | — | |
| SCHEMBL19988288 | 0.76 | — | — | |
| SCHEMBL1573677 | 0.76 | — | — | |
| SCHEMBL22570324 | 0.76 | — | — | |
| SCHEMBL332866 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1278786-B1 | COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR | DU PONT (US) | 2006-01-04 | — | — | EP | disclosed |
| EP-1278786-A2 | COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-01-29 | — | — | EP | disclosed |
| WO-2001085811-A2 | COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | disclosed |