⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7888869 | 0.77 | KDM4E (0.45) | — | |
| SCHEMBL7896194 | 0.77 | — | — | |
| SCHEMBL7898986 | 0.75 | — | — | |
| SCHEMBL8346097 | 0.73 | MEN1 (0.39) | — | |
| SCHEMBL7896173 | 0.73 | — | — | |
| SCHEMBL10597985 | 0.73 | KDM4E (0.32) | — | |
| SCHEMBL7897539 | 0.73 | — | — | |
| SCHEMBL10626587 | 0.73 | KDM4E (0.33) | — | |
| SCHEMBL10766054 | 0.71 | PTPN1 (0.35) | — | |
| SCHEMBL28789752 | 0.70 | CYP2D6 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1405141-A4 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE INC (US) | 2006-09-20 | — | — | EP | claimed |
| EP-1405141-A1 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | Citiplate, Inc. (US) | 2004-04-07 | — | — | EP | claimed |
| WO-2003001300-A1 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE, INC. (US) | 2003-01-03 | — | — | WO | claimed |
| US-6436601-B1 | Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements | CITIPLATE, INC. | 2002-08-20 | — | — | US | claimed |
| WO-1991019227-A1 | LIGHT SENSITIVE MATERIALS FOR LITHOGRAPHIC PLATES | HORSELL PLC (GB) | 1991-12-12 | — | — | WO | claimed |
| JP-7172063-A | — | — | None | — | — | JP | disclosed |
| US-11762290-B2 | Photoresist composition, method for preparing the same, and patterning method | Beijing Asahi Electronic Materials Co., Ltd (CN) | 2023-09-19 | — | — | US | disclosed |
| CN-114634429-B | Photosensitive diamine monomer and preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115073732-A | Block type photosensitive polyimide precursor resin, preparation method thereof and block type photosensitive resin composition | 波米科技有限公司 | 2022-09-20 | — | — | CN | disclosed |
| CN-114805810-A | Photosensitive polyimide precursor resin, preparation method thereof and photosensitive resin composition | 波米科技有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-114634429-A | Photosensitive diamine monomer, preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-06-17 | — | — | CN | disclosed |
| US-20210096463-A1 | PHOTORESIST COMPOSITION, METHOD FOR PREPARING THE SAME, AND PATTERNING METHOD | Beijing Asahi Electronic Materials Co.,Ltd (CN) | 2021-04-01 | — | — | US | disclosed |
| US-4551415-A | DRY FILM PHOTORESIST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-11-05 | — | — | US | disclosed |
| US-4482625-A | TRANSFERRING SUPERIMPOSED COLOR SEPARATION IMAGES; MULTICOLOR; PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1984-11-13 | — | — | US | disclosed |
| EP-0092783-A2 | Photosensitive coatings containing crosslinked beads | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-02 | — | — | EP | disclosed |
| US-4268541-A | Process for producing a material having a vapor-deposited metal layer, and process for producing a recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1981-05-19 | — | — | US | disclosed |
| US-4193797-A | Method for making photoresists | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1980-03-18 | — | — | US | disclosed |
| US-4164421-A | Photocurable composition containing an o-quinonodiazide for printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1979-08-14 | — | — | US | disclosed |
| US-4065306-A | Electron beam recording media containing 4,4'-bis(3-diazo-3,4-dihydro-4-oxo-1-naphthalene-sulfonyloxy)benzil | RCA CORPORATION (US) | 1977-12-27 | — | — | US | disclosed |
| US-4005437-A | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil | RCA CORPORATION (US) | 1977-01-25 | — | — | US | disclosed |