Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | MAOB | P27338 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1501168 | 0.90 | HTR2A (0.38) | CYP2D6HTR2AMAOAMAOB | |
| SCHEMBL29963387 | 0.90 | HTR2A (0.38) | CYP2D6HTR2AMAOAMAOB | |
| SCHEMBL10672088 | 0.79 | HTR2A (0.33) | HTR2A | |
| SCHEMBL2192826 | 0.76 | HTR2A (0.33) | CYP2D6HTR2A | |
| SCHEMBL31099344 | 0.75 | HTR2A (0.50) | CYP2D6HTR2AMAOAMAOB | |
| SCHEMBL1276091 | 0.75 | HTR2A (0.50) | CYP2D6HTR2AMAOAMAOB | |
| SCHEMBL899605 | 0.75 | — | — | |
| SCHEMBL5675229 | 0.70 | — | — | |
| SCHEMBL5041961 | 0.69 | TTR (0.31) | — | |
| SCHEMBL5034536 | 0.68 | RET (0.36) | CYP2D6HTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114634429-B | Photosensitive diamine monomer and preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114634429-A | Photosensitive diamine monomer, preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-06-17 | — | — | CN | claimed |
| CN-114805810-B | Photosensitive polyimide precursor resin, preparation method and photosensitive resin composition | 波米科技有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-115073732-B | Block type photosensitive polyimide precursor resin, preparation method thereof and block type photosensitive resin composition | 波米科技有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-114634429-B | Photosensitive diamine monomer and preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-114634429-A | Photosensitive diamine monomer, preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-06-17 | — | — | CN | disclosed |