Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.60 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.60 |
| ▸ | CDC25B | P30305 | 2/20 | 0.60 |
| ▸ | BCL2 | P10415 | 1/20 | 0.56 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 6/20 | 0.54 |
| ▸ | RAB9A | P51151 | 6/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.54 |
| ▸ | MAPT | P10636 | 4/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.54 |
| ▸ | APAF1 | O14727 | 2/20 | 0.54 |
| ▸ | THRB | P10828 | 2/20 | 0.54 |
| ▸ | HTT | P42858 | 2/20 | 0.54 |
| ▸ | GALK1 | P51570 | 2/20 | 0.54 |
| ▸ | BLM | P54132 | 2/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.54 |
| ▸ | XBP1 | P17861 | 1/20 | 0.54 |
| ▸ | PTBP1 | P26599 | 1/20 | 0.54 |
| ▸ | SMAD3 | P84022 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Anthraquinone SCHEMBL28835137 | 1.00 | MEN1 (0.60) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL29750116 | 0.98 | MEN1 (0.57) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL27501679 | 0.95 | MEN1 (0.50) | MEN1KMT2ACDC25BBCL2MCL1 | |
| Anthraquinone SCHEMBL27901882 | 0.84 | MEN1 (0.67) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL3925146 | 0.84 | NPC1 (0.64) | MEN1KMT2ACDC25BBCL2MCL1 | |
| Anthraquinone SCHEMBL27283959 | 0.84 | MEN1 (0.75) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL19001704 | 0.82 | NPC1 (0.68) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL13976242 | 0.82 | PTPRC (0.48) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL1038974 | 0.81 | ADORA2A (0.57) | MEN1KMT2ACDC25BBCL2MCL1 | |
| SCHEMBL57813 | 0.81 | NPC1 (0.80) | MEN1KMT2ACDC25BBCL2MCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2347 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) | 2025-07-24 | — | — | US | claimed |
| CN-119165729-A | Photosensitive resist ink and preparation method of metal grid line | 杭州福斯特电子材料有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-113341647-B | Dry film resist composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-117687268-B | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117687268-A | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| CN-116184763-A | Photocurable resin composition and application thereof | 杭州福斯特电子材料有限公司 | 2023-05-30 | — | — | CN | claimed |
| CN-110471256-B | Photosensitive resin composition | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-113801291-B | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-106249545-B | It is a kind of can selfreparing photosensitive dry film solder mask | 杭州福斯特应用材料股份有限公司 | 2019-06-25 | — | — | CN | claimed |
| CN-109856912-A | A kind of high adhesion force photosensitive polymer combination | 浙江福斯特新材料研究院有限公司 | 2019-06-07 | — | — | CN | claimed |
| CN-108490737-A | A kind of photosensitive polymer combination and application thereof | 浙江福斯特新材料研究院有限公司 | 2018-09-04 | — | — | CN | claimed |
| CN-107329368-A | A kind of solvable photosensitive composite of alkali and preparation method and application | 江苏广信感光新材料股份有限公司 | 2017-11-07 | — | — | CN | claimed |
| CN-107219726-A | A kind of resin combination and purposes | 浙江福斯特新材料研究院有限公司 | 2017-09-29 | — | — | CN | claimed |
| CN-107203095-A | A kind of solvable photosensitive composite of white alkali and preparation method and application | 江苏广信感光新材料股份有限公司 | 2017-09-26 | — | — | CN | claimed |
| CN-105511227-A | Dry film resist with good hole shielding function and laminated body thereof | HANGZHOU FIRST PV MAT CO LTD | 2016-04-20 | — | — | CN | claimed |
| WO-2009054621-A2 | THE COMPOSITION OF DECOLORABLE INK AND DECOLORING METHOD | HAN JONG-SOO (KR) | 2009-04-30 | — | — | WO | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-4438190-A | PROTECTIVE COATINGS FOR PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1984-03-20 | — | — | US | claimed |