Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.80 |
| ▸ | RAB9A | P51151 | 5/20 | 0.80 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.80 |
| ▸ | MAPT | P10636 | 3/20 | 0.80 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.80 |
| ▸ | MEN1 | O00255 | 2/20 | 0.80 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.80 |
| ▸ | LMNA | P02545 | 2/20 | 0.80 |
| ▸ | APAF1 | O14727 | 1/20 | 0.80 |
| ▸ | THRB | P10828 | 1/20 | 0.80 |
| ▸ | XBP1 | P17861 | 1/20 | 0.80 |
| ▸ | PTBP1 | P26599 | 1/20 | 0.80 |
| ▸ | HTT | P42858 | 1/20 | 0.80 |
| ▸ | GALK1 | P51570 | 1/20 | 0.80 |
| ▸ | BLM | P54132 | 1/20 | 0.80 |
| ▸ | SMAD3 | P84022 | 1/20 | 0.80 |
| ▸ | ATM | Q13315 | 1/20 | 0.80 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.80 |
| ▸ | PTPRC | P08575 | 6/20 | 0.55 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30722379 | 1.00 | NPC1 (0.80) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL21993324 | 1.00 | NPC1 (0.80) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL7322266 | 0.98 | MEN1 (0.84) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL1482692 | 0.98 | MEN1 (0.84) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL4410719 | 0.98 | MEN1 (0.76) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL19001850 | 0.94 | NPC1 (0.78) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL19001853 | 0.94 | NPC1 (0.78) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL28198235 | 0.93 | MEN1 (0.92) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL978978 | 0.93 | NPC1 (0.92) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 | |
| SCHEMBL18073335 | 0.93 | NPC1 (0.83) | NPC1RAB9ASMN1; SMN2MAPTL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2312 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119842269-A | Black pigment liquid and preparation method thereof, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-119799077-A | Pigment dispersion liquid, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-114805398-A | Preparation method of ecteinascidin compound | 江苏恒瑞医药股份有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-107077068-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-03-12 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-105511227-B | A kind of dry film photoresist and its layered product with good hole masking function | 杭州福斯特应用材料股份有限公司 | 2019-08-02 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-106249545-B | It is a kind of can selfreparing photosensitive dry film solder mask | 杭州福斯特应用材料股份有限公司 | 2019-06-25 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| CN-106249545-A | A kind of can the photosensitive dry film solder mask of selfreparing | 杭州福斯特光伏材料股份有限公司 | 2016-12-21 | — | — | CN | claimed |
| CN-105511227-A | Dry film resist with good hole shielding function and laminated body thereof | HANGZHOU FIRST PV MAT CO LTD | 2016-04-20 | — | — | CN | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-3941759-A | A QUINONE PHOTOSENSITIZER AND A TRANSITION METAL DIALKYL-DITHIOCARBAMATE | OWENS-ILLINOIS, INC. (US) | 1976-03-02 | — | — | US | claimed |
| EP-4749682-A1 | CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE | Canon Kabushiki Kaisha (JP) | 2026-05-27 | — | — | EP | disclosed |
| CN-122095314-A | Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern | — | 2026-05-26 | — | — | CN | disclosed |
| US-3941759-A | A QUINONE PHOTOSENSITIZER AND A TRANSITION METAL DIALKYL-DITHIOCARBAMATE | OWENS-ILLINOIS, INC. (US) | 1976-03-02 | — | — | US | disclosed |
| US-3930963-A | METHOD FOR THE PRODUCTION OF RADIANT ENERGY IMAGED PRINTED CIRCUIT BOARDS | PHOTOCIRCUITS DIVISION OF KOLLMORGEN CORPORATION (US) | 1976-01-06 | — | — | US | disclosed |