⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL994752 | 0.75 | — | — | |
| SCHEMBL727866 | 0.75 | — | — | |
| SCHEMBL2320913 | 0.74 | — | — | |
| SCHEMBL8222320 | 0.74 | — | — | |
| SCHEMBL8204215 | 0.73 | — | — | |
| SCHEMBL15404472 | 0.72 | — | — | |
| SCHEMBL13555425 | 0.71 | — | — | |
| SCHEMBL15404469 | 0.71 | — | — | |
| SCHEMBL4412191 | 0.71 | — | — | |
| SCHEMBL2488899 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240158551-A1 | FLUORORESIN | TOSOH CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| US-20240141081-A1 | FLUORORESIN, AND METHOD FOR PRODUCING SAME | TOSOH CORPORATION (JP) | 2024-05-02 | — | — | US | disclosed |
| CN-117447635-A | Fluororesin, fluororesin particle, and method for producing same | 东曹株式会社 | 2024-01-26 | — | — | CN | disclosed |
| CN-117447634-A | Fluororesin, fluororesin particle, and method for producing same | 东曹株式会社 | 2024-01-26 | — | — | CN | disclosed |
| CN-117136202-A | Fluorine-based resin, composition, photocrosslinked product, and electronic device provided with same | 东曹株式会社 | 2023-11-28 | — | — | CN | disclosed |
| CN-112771086-B | Fluororesin, fluororesin particle, and method for producing same | 东曹株式会社 | 2023-09-26 | — | — | CN | disclosed |
| US-20230118752-A1 | FLUORORESIN AND METHOD FOR PRODUCING SAME | TOSOH CORPORATION (JP) | 2023-04-20 | — | — | US | disclosed |
| EP-4129992-A1 | FLUORINE RESIN AND METHOD FOR PRODUCING SAME | Tosoh Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| CN-115677887-A | Fluororesin, process for producing the same, and process for producing fluororesin particles | 东曹株式会社 | 2023-02-03 | — | — | CN | disclosed |
| CN-114450318-A | Polymer, photosensitive resin composition, resin film, and electronic device | 住友电木株式会社 | 2022-05-06 | — | — | CN | disclosed |
| EP-3576175-B1 | COMPOSITION, FILM USING SAID COMPOSITION, AND METHOD FOR PRODUCING LIGHT EMITTING ELEMENT | SUMITOMO CHEMICAL CO (JP) | 2021-06-16 | — | — | EP | disclosed |
| CN-112805308-A | Fluororesin, method for producing same, and method for producing fluororesin particles | 东曹株式会社 | 2021-05-14 | — | — | CN | disclosed |
| CN-112771086-A | Fluororesin, fluororesin particles, and processes for producing these | 东曹株式会社 | 2021-05-07 | — | — | CN | disclosed |
| WO-2021060080-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | 住友ベークライト株式会社 | 2021-04-01 | — | — | WO | disclosed |
| WO-2020067421-A1 | FLUORORESIN, FLUORORESIN PARTICLES, AND METHODS FOR PRODUCING THESE | 東ソ－株式会社 | 2020-04-02 | — | — | WO | disclosed |
| EP-0849727-B1 | Optical recording disk | MITSUBISHI CHEM CORP (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-20050194588-A1 | Fluorine compound, liquid repellent membrane using the same and product using the same | HITACHI, LTD. (JP) | 2005-09-08 | — | — | US | disclosed |
| EP-1138684-A1 | FLUORINATED ORGANOMETALLIC COMPOUNDS | Daikin Industries, Ltd. (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-6232036-B1 | DISKS; TRANPARENT SUBSTRATES, ORGANIC PIGMENTS | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-05-15 | — | — | US | disclosed |
| EP-0849727-A2 | Optical recording disk | Mitsubishi Chemical Corporation (JP) | 1998-06-24 | — | — | EP | disclosed |