SCHEMBL994752

SCHEMBL994752

OC(F)(F)C(F)CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4412191 0.75
SCHEMBL5679559 0.75
SCHEMBL8108428 0.75
SCHEMBL11486341 0.73
SCHEMBL24709 0.72
SCHEMBL15403821 0.72
SCHEMBL19343737 0.72
SCHEMBL9546082 0.71
SCHEMBL196432 0.71
SCHEMBL16014762 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024047645-A1 LIPOSOME-CONTAINING COSMETIC COMPOSITIONS LIPOSPHERE LTD. (IL) 2024-03-07 WO disclosed
WO-2023039146-A1 COMPOSITIONS AND METHODS FOR DECONTAMINATION OF HAZARDOUS-POROUS MATERIAL PHEONIX BRANDS, LLC (US) 2023-03-16 WO disclosed
WO-2020232435-A1 COMPOSITIONS AND METHODS FOR THE REMOVAL OF HYDROCARBON RESIDUES Soteria Group, Inc. (US) 2020-11-19 WO disclosed
EP-2878607-B1 PHOTOSENSITIVE RESIN COMPOSITION AND ANTIREFLECTION FILM NIPPON KAYAKU KK (JP) 2018-11-28 EP disclosed
EP-2878607-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ANTIREFLECTION FILM Nippon Kayaku Kabushiki Kaisha (JP) 2015-06-03 EP disclosed
US-20150148474-A1 Photosensitive Resin Composition And Antireflection Film NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2015-05-28 US disclosed
US-20110009518-A1 Photosetting type bio-based coating composition and its coated article NIPPON BEE CHEMICAL CO., LTD. (JP) 2011-01-13 US disclosed