Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | RAD52 | P43351 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Thioglycolic Acid SCHEMBL11591978 | 0.93 | MEN1 (0.43) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL3395917 | 0.91 | RAD52 (0.49) | MEN1KMT2ASMN1; SMN2RAD52LMNA | |
| SCHEMBL10768897 | 0.91 | KMT2A (0.45) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL20904086 | 0.91 | KDM4E (0.48) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL12238647 | 0.88 | RAD52 (0.45) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL10993847 | 0.86 | CNR2 (0.46) | MEN1KMT2AGAAMAPTRAD52 | |
| N-Benzylaniline SCHEMBL10772728 | 0.85 | CA1 (0.45) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL17858617 | 0.85 | SMN1; SMN2 (0.44) | MEN1KMT2ASMN1; SMN2GAAMAPT | |
| SCHEMBL11699405 | 0.85 | RAD52 (0.44) | MEN1KMT2ASMN1; SMN2GAARAD52 | |
| SCHEMBL554904 | 0.84 | THRB (0.42) | MEN1KMT2ASMN1; SMN2GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5547727-A | RADIATION TRANSPARENT SUBSTRATE WITH RECORDING AND REFLECTION LAYERS WITH DYES OF CATIONIC AZOCYANINE DYES | EASTMAN KODAK COMPANY (US) | 1996-08-20 | — | — | US | claimed |
| EP-0717402-A2 | Optical recording elements having recording layers containing cationic azo dyes | EASTMAN KODAK COMPANY (US) | 1996-06-19 | — | — | EP | claimed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20120225386-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-09-06 | — | — | US | disclosed |
| US-7087358-B2 | Image-formation material and infrared absorber | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-08 | — | — | US | disclosed |
| EP-1246016-B1 | Electrophotographic element comprising an insulating charge transport layer | EASTMAN KODAK CO (US) | 2006-05-24 | — | — | EP | disclosed |
| EP-1059164-B1 | Image recording material and planographic printing plate using same | FUJI PHOTO FILM CO LTD (JP) | 2006-04-19 | — | — | EP | disclosed |
| EP-1038668-B1 | Photosensitive composition and planographic printing plate precursor using same | FUJI PHOTO FILM CO LTD (JP) | 2005-05-25 | — | — | EP | disclosed |
| US-4119622-A | Pyrazolonylazoaniline or aminonaphtyl compounds for copying processes | BASF AKTIENGESELLSCHAFT (DE) | 1978-10-10 | — | — | US | disclosed |
| US-4105655-A | PHENYL-AZO-ANILINO DYESTUFF | BAYER AKTIENGESELLSCHAFT (DE) | 1978-08-08 | — | — | US | disclosed |
| US-4036824-A | Disazo dyestuffs containing A-O-alkylene-O-SO3 H group | BAYER AKTIENGESELLSCHAFT (DT) | 1977-07-19 | — | — | US | disclosed |
| US-4022763-A | Sulfaphenyl-azo-phenyl-azo-aminophenyl dyestuffs | BAYER AKTIENGESELLSCHAFT (DT) | 1977-05-10 | — | — | US | disclosed |
| US-4013632-A | SYNTHETIC FIBERS | PRODUITS CHIMIQUES UGINE KUHLMANN (FR) | 1977-03-22 | — | — | US | disclosed |
| US-4006127-A | Cationic diazacyanine dyestuffs | BAYER AKTIENGESELLSCHAFT (DT) | 1977-02-01 | — | — | US | disclosed |
| US-3997519-A | Method of producing quaternary pyridinium compounds | GAF CORPORATION (US) | 1976-12-14 | — | — | US | disclosed |
| US-3978039-A | POLYAMIDES | BAYER AKTIENGESELLSCHAFT (DT) | 1976-08-24 | — | — | US | disclosed |
| US-3962209-A | PROCESS FOR PREPARING AZO DYESTUFFS WITH ORTHO-AZO CYANO GROUPS BY CYANO EXCHANGE OF METAL CYANIDES AND HALO DYESTUFFS | BAYER AKTIENGESELLSCHAFT (DT) | 1976-06-08 | — | — | US | disclosed |