Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6753300 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL7092806 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL7552879 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL6653774 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL3926781 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL7550087 | 0.80 | — | — | |
| SCHEMBL4577686 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL7548173 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL124211 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL2476497 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1097949-B1 | Ethylene/alpha-olefin copolymer and film made therefrom | JAPAN POLYCHEM CORP (JP) | 2006-08-02 | — | — | EP | disclosed |
| EP-1359167-B1 | ETHYLENE POLYMERS | JAPAN POLYCHEM CORP (JP) | 2006-06-14 | — | — | EP | disclosed |
| US-6953831-B2 | Excellent balance between rigidity and environmental stress cracking resistance, and excellent rigidity molding processability | JAPAN POLYCHEM CORPORATION (JP) | 2005-10-11 | — | — | US | disclosed |
| US-20040048993-A1 | Ethylene polymer | JAPAN POLYCHEM CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| EP-1359167-A1 | ETHYLENE POLYMERS | Japan Polychem Corporation (JP) | 2003-11-05 | — | — | EP | disclosed |
| US-6632911-B1 | Blown films of these copolymers are excellent in mechanical characteristics (tensile strength, impact strength, etc.) | JAPAN POLYCHEM CORPORATION (JP) | 2003-10-14 | — | — | US | disclosed |
| EP-1097949-A1 | Ethylene/alpha-olefin copolymer and film made thereof | Japan Polychem Corporation (JP) | 2001-05-09 | — | — | EP | disclosed |